Plasmonic nanocomposites of zinc oxide and titanium nitride

Chad A. Beaudette, Jacob T. Held, Benjamin L. Greenberg, Phong H. Nguyen, Nolan M. Concannon, Russell J. Holmes, K. Andre Mkhoyan, Eray S. Aydil, Uwe R. Kortshagen

Research output: Contribution to journalArticlepeer-review

3 Scopus citations


The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.

Original languageEnglish (US)
Article number042404
Pages (from-to)042404
JournalJournal of Vacuum Science and Technology A
Issue number4
StatePublished - Jul 1 2020

Bibliographical note

Funding Information:
This project was supported by the MRSEC program of the National Science Foundation under Award No. DMR-1420013 and by the Research Experiences for Undergraduates (REU) Program of the National Science Foundation under Award No. DMR-1852044. STEM, XPS, and ellipsometry were performed in the College of Science and Engineering Characterization Facility of the University of Minnesota, which receives partial support from the NSF through the MRSEC program. Portions of this work were conducted in the Minnesota Nano Center, which is supported by the National Science Foundation through the National Nano Coordinated Infrastructure Network (Award No. NNCI-1542202). N.M.C. acknowledges support from the NSF Graduate Research Fellowship under Grant No. 00074041. The authors thank T. L. Senkow for her assistance in editing the manuscript. The authors are grateful to Ognjen Ilic for advice regarding the Mie scattering calculations.

Publisher Copyright:
© 2020 Author(s).

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