Plasma Chemistry in a Humid AR Radiofrequency (RF) Atmospheric Pressure Plasma Jet ∗

Jingkai Jiang; V. S. Santosh; K. Kondeti; Gaurav Nayak; Peter J. Bruggeman

doi:10.1109/ICOPS36761.2021.9588648

Plasma Chemistry in a Humid AR Radiofrequency (RF) Atmospheric Pressure Plasma Jet ^∗

Jingkai Jiang, V. S. Santosh, K. Kondeti, Gaurav Nayak, Peter J. Bruggeman

Mechanical Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Atmospheric pressure plasma jets (APPJs) operated in mixtures of noble gas and water vapor have attracted a lot of attention due to their potential applications in water treatment and biomedicine. The importance of plasma-produced H and OH radicals, as well as H 2 O 2 , has been demonstrated in previous studies. To control the density of desired reactive species, a more detailed picture of the rich chemistry in water vapor plasmas is needed. Unfortunately, validated numerical models of plasma chemistry in water vapor containing plasmas remain limited.

Original language	English (US)
Title of host publication	2021 IEEE International Conference on Plasma Science, ICOPS 2021
Publisher	Institute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)	9781665432276
DOIs	https://doi.org/10.1109/ICOPS36761.2021.9588648
State	Published - Sep 12 2021
Event	2021 IEEE International Conference on Plasma Science, ICOPS 2021 - Lake Tahoe, United States Duration: Sep 12 2021 → Sep 16 2021

Publication series

Name	IEEE International Conference on Plasma Science
Volume	2021-September
ISSN (Print)	0730-9244

Conference

Conference	2021 IEEE International Conference on Plasma Science, ICOPS 2021
Country/Territory	United States
City	Lake Tahoe
Period	9/12/21 → 9/16/21

Bibliographical note

Funding Information:
________________________________ * This work was supported by the US Department of Energy, Office of Science, Office of Fusion Energy Sciences General Plasma Science program under award number DE-SC0016053. The work heavily relied on equipment and methods developed within the project DE-SC0001939.

Publisher Copyright:
© 2021 IEEE.

Publisher link

10.1109/ICOPS36761.2021.9588648

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Cite this

Jiang, J., Santosh, V. S., Kondeti, K., Nayak, G., & Bruggeman, P. J. (2021). Plasma Chemistry in a Humid AR Radiofrequency (RF) Atmospheric Pressure Plasma Jet ^∗. In 2021 IEEE International Conference on Plasma Science, ICOPS 2021 (IEEE International Conference on Plasma Science; Vol. 2021-September). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/ICOPS36761.2021.9588648

Plasma Chemistry in a Humid AR Radiofrequency (RF) Atmospheric Pressure Plasma Jet ^∗. / Jiang, Jingkai; Santosh, V. S.; Kondeti, K. et al.
2021 IEEE International Conference on Plasma Science, ICOPS 2021. Institute of Electrical and Electronics Engineers Inc., 2021. (IEEE International Conference on Plasma Science; Vol. 2021-September).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Jiang, J, Santosh, VS, Kondeti, K, Nayak, G & Bruggeman, PJ 2021, Plasma Chemistry in a Humid AR Radiofrequency (RF) Atmospheric Pressure Plasma Jet ^∗. in 2021 IEEE International Conference on Plasma Science, ICOPS 2021. IEEE International Conference on Plasma Science, vol. 2021-September, Institute of Electrical and Electronics Engineers Inc., 2021 IEEE International Conference on Plasma Science, ICOPS 2021, Lake Tahoe, United States, 9/12/21. https://doi.org/10.1109/ICOPS36761.2021.9588648

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