Original language | English (US) |
---|---|
Pages (from-to) | 1-2 |
Number of pages | 2 |
Journal | Plasma Chemistry and Plasma Processing |
Volume | 26 |
Issue number | 1 |
DOIs | |
State | Published - Feb 2006 |
Plasma Chemistry and Plasma: Editorial
Steven L. Girshick, Stan Vepřek
Research output: Contribution to journal › Editorial › peer-review