Plasma-assisted synthesis of silicon nanocrystal inks

Lorenzo Mangolini, Uwe Kortshagen

Research output: Contribution to journalArticlepeer-review

187 Scopus citations

Abstract

A novel approach for the surface functionalization of silicon nanocrystals through plasma aided grafting of organic molecules has been discussed. Silicon nanocrystals were synthesized on timescales of a few milliseconds from silane precursor gas in a simple radiofrequency powered flow-through reactor. The surface functionalization was performed immediately after synthesis by plasma-assisted in-flight grafting of organic molecules in the non-thermal plasma chamber. The electrostatic charging of nanocrystals in the non-thermal plasma minimized particle aggregation and diffusional losses. The plasma grafted silicon nanocrystals were found to be immediately soluble in nonpolar solvents to form a silicon crystal ink, and in terms of their infrared absorbance, appeared equivalent to liquid-phase functionalized nanocrystals.

Original languageEnglish (US)
Pages (from-to)2513-2519
Number of pages7
JournalAdvanced Materials
Volume19
Issue number18
DOIs
StatePublished - Sep 17 2007

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