Plasma-assisted deposition of nanostructured films and coatings

Research output: Contribution to journalReview article

1 Citation (Scopus)

Abstract

Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.

Original languageEnglish (US)
Pages (from-to)293-298
Number of pages6
JournalHigh Temperature Material Processes
Volume15
Issue number4
DOIs
StatePublished - Dec 1 2011

Fingerprint

Plasmas
coatings
Coatings
Powders
sprayers
Plasma Gases
Plasma torches
torches
Spray pyrolysis
thermal plasmas
hypersonics
Hypersonic aerodynamics
spraying
Spraying
pyrolysis
flash
Nanostructures
Evaporation
low pressure
evaporation

Keywords

  • Dusty plasmas
  • Hypersonic plasma particle deposition
  • Nanoparticles
  • Nanostructured films
  • Plasma spraying

Cite this

Plasma-assisted deposition of nanostructured films and coatings. / Girshick, Steven L.

In: High Temperature Material Processes, Vol. 15, No. 4, 01.12.2011, p. 293-298.

Research output: Contribution to journalReview article

@article{de8465b9c39f4dd2a572c7cbb7213c39,
title = "Plasma-assisted deposition of nanostructured films and coatings",
abstract = "Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.",
keywords = "Dusty plasmas, Hypersonic plasma particle deposition, Nanoparticles, Nanostructured films, Plasma spraying",
author = "Girshick, {Steven L}",
year = "2011",
month = "12",
day = "1",
doi = "10.1615/HighTempMatProc.v15.i4.50",
language = "English (US)",
volume = "15",
pages = "293--298",
journal = "High Temperature Materials and Processes",
issn = "1093-3611",
publisher = "Begell House Inc.",
number = "4",

}

TY - JOUR

T1 - Plasma-assisted deposition of nanostructured films and coatings

AU - Girshick, Steven L

PY - 2011/12/1

Y1 - 2011/12/1

N2 - Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.

AB - Recent work is reviewed on plasma-assisted deposition of nanostructured films and coatings. Several methods are being developed. These include conventional plasma spray in which nanostructure is induced in the coarse feed powder by mechanical milling before spraying; thermal plasma spray pyrolysis; plasma flash evaporation of fine powders injected into an RF torch; hypersonic plasma particle deposition; and low-pressure plasma synthesis and deposition of nanoparticles to produce thin films.

KW - Dusty plasmas

KW - Hypersonic plasma particle deposition

KW - Nanoparticles

KW - Nanostructured films

KW - Plasma spraying

UR - http://www.scopus.com/inward/record.url?scp=84863108095&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84863108095&partnerID=8YFLogxK

U2 - 10.1615/HighTempMatProc.v15.i4.50

DO - 10.1615/HighTempMatProc.v15.i4.50

M3 - Review article

VL - 15

SP - 293

EP - 298

JO - High Temperature Materials and Processes

JF - High Temperature Materials and Processes

SN - 1093-3611

IS - 4

ER -