Photopatternable interfaces for block copolymer lithography

Michael J. Maher, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, Jeffrey L. Self, Dustin W. Janes, William J. Durand, Austin P. Lane, Christopher J. Ellison, C. Grant Willson

Research output: Contribution to journalArticlepeer-review

25 Scopus citations


Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ("N2P") or preferential to neutral ("P2N"). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.

Original languageEnglish (US)
Pages (from-to)824-828
Number of pages5
JournalACS Macro Letters
Issue number8
StatePublished - Aug 19 2014
Externally publishedYes


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