Photopatternable interfaces for block copolymer lithography

Michael J Maher; Christopher M. Bates; Gregory Blachut; Matthew C. Carlson; Jeffrey L Self; Dustin W Janes; William J. Durand; Austin P. Lane; Christopher J. Ellison; C. Grant Willson

doi:10.1021/mz500370r

Photopatternable interfaces for block copolymer lithography

Michael J Maher, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, Jeffrey L Self, Dustin W Janes, William J. Durand, Austin P. Lane, Christopher J. Ellison, C. Grant Willson

Research output: Contribution to journal › Article › peer-review

25 Scopus citations

Abstract

Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ("N2P") or preferential to neutral ("P2N"). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.

Original language	English (US)
Pages (from-to)	824-828
Number of pages	5
Journal	ACS Macro Letters
Volume	3
Issue number	8
DOIs	https://doi.org/10.1021/mz500370r
State	Published - Aug 19 2014
Externally published	Yes

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title = "Photopatternable interfaces for block copolymer lithography",

abstract = "Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ({"}N2P{"}) or preferential to neutral ({"}P2N{"}). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.",

author = "Maher, {Michael J} and Bates, {Christopher M.} and Gregory Blachut and Carlson, {Matthew C.} and Self, {Jeffrey L} and Janes, {Dustin W} and Durand, {William J.} and Lane, {Austin P.} and Ellison, {Christopher J.} and Willson, {C. Grant}",

year = "2014",

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doi = "10.1021/mz500370r",

language = "English (US)",

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T1 - Photopatternable interfaces for block copolymer lithography

AU - Maher, Michael J

AU - Bates, Christopher M.

AU - Blachut, Gregory

AU - Carlson, Matthew C.

AU - Self, Jeffrey L

AU - Janes, Dustin W

AU - Durand, William J.

AU - Lane, Austin P.

AU - Ellison, Christopher J.

AU - Willson, C. Grant

PY - 2014/8/19

Y1 - 2014/8/19

N2 - Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ("N2P") or preferential to neutral ("P2N"). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.

AB - Directly photopatternable interfaces are introduced that facilitate two-dimensional spatial control of block copolymer (BCP) orientation in thin films. Copolymers containing an acid labile monomer were synthesized, formulated with a photoacid generator (PAG), and coated to create grafted surface treatments (GSTs). These as-cast GST films are either inherently neutral or preferential (but not both) to lamella-forming poly(styrene-block- trimethylsilylstyrene) (PS-b-PTMSS). Subsequent contact printing and baking produced GSTs with submicron chemically patterned gratings. The catalytic reaction of the photoacid generated in the UV-exposed regions of the GSTs changed the interfacial interactions between the BCP and the GST in one of two ways: from neutral to preferential ("N2P") or preferential to neutral ("P2N"). When PS-b-PTMSS was thermally annealed between a chemically patterned GST and a top coat, alternating regions of perpendicular and parallel BCP lamellae were formed.

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DO - 10.1021/mz500370r

M3 - Article

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JO - ACS Macro Letters

JF - ACS Macro Letters

IS - 8

ER -

Photopatternable interfaces for block copolymer lithography

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