Photoelectrochemical investigations of thin metal-oxide films: TiO2, Al2O3, and HfO2 on the parent metals

Johanes P.H. Sukamto, Christopher S. McMillan, William Smyrl

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Photoelectrochemical measurements on thin metal-oxide films are discussed. It is shown that for very thin films, multiple internal reflection effects cause the photocurrent to be a strong function of film thickness. The discussion also includes metal-oxide/electrolyte interface dominated photocurrent and metal-oxide/metal interface dominated internal photoemission processes.

Original languageEnglish (US)
Pages (from-to)15-27
Number of pages13
JournalElectrochimica Acta
Issue number1
StatePublished - Jan 1993


  • dye sensitization
  • internal reflections.
  • photoelectrochemical microscopy
  • photoemission

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