Abstract
Photoelectrochemical measurements on thin metal-oxide films are discussed. It is shown that for very thin films, multiple internal reflection effects cause the photocurrent to be a strong function of film thickness. The discussion also includes metal-oxide/electrolyte interface dominated photocurrent and metal-oxide/metal interface dominated internal photoemission processes.
Original language | English (US) |
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Pages (from-to) | 15-27 |
Number of pages | 13 |
Journal | Electrochimica Acta |
Volume | 38 |
Issue number | 1 |
DOIs | |
State | Published - Jan 1993 |
Keywords
- dye sensitization
- internal reflections.
- photoelectrochemical microscopy
- photoemission