Photochemical reactions for replicating and aligning block copolymer thin film patterns

Dustin W. Janes, Takejiro Inoue, Bradley D. McCoy, Ishita Madan, Paul F. Nealey, C. Grant Willson, Christopher J. Ellison

Research output: Contribution to journalArticlepeer-review

5 Scopus citations


A photochemical process for transfer printing patterns formed by block copolymer thin films is described here. An unpatterned, transparent substrate coated in liquid conformal layer is pressed to an epitaxially aligned block copolymer thin film. Irradiation through the sample stack by UV light drives a benzophenone-mediated grafting reaction which covalently bonds the top surface of the block copolymer film to the photopolymerized conformal layer. Separation of the sample stack recovers the original guiding pattern as well a new chemically patterned substrate replicated from the original pattern. Using a single lithographically directed chemical pattern, 10 replicas are generated, each possessing 28 nm periodicity, perpendicularly oriented microdomains, and long-range epitaxial alignment.

Original languageEnglish (US)
Pages (from-to)435-440
Number of pages6
JournalJournal of Photopolymer Science and Technology
Issue number4
StatePublished - Sep 13 2014
Externally publishedYes

Bibliographical note

Publisher Copyright:
© 2014SPST.


  • Benzophenone
  • Block copolymer
  • Directed self-assembly
  • Transfer printing


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