We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.
|Original language||English (US)|
|Number of pages||8|
|Journal||Institute of Environmental Sciences - Proceedings, Annual Technical Meeting|
|State||Published - Dec 1 1995|
|Event||Proceedings of the 41st Annual Technical Meeting of the Institute of Environmental Sciences - Anaheim, CA, USA|
Duration: Apr 30 1995 → May 5 1995