Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films

Paul J. Ziemann; Peng Liu; Sandeep Nijhawan; David B Kittelson; Peter H McMurry; Stephen A Campbell

Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films

Paul J. Ziemann, Peng Liu, Sandeep Nijhawan, David B Kittelson, Peter H McMurry, Stephen A Campbell

Research output: Contribution to journal › Conference article › peer-review

Abstract

We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.

Original language	English (US)
Pages (from-to)	22-29
Number of pages	8
Journal	Institute of Environmental Sciences - Proceedings, Annual Technical Meeting
State	Published - 1995
Event	Proceedings of the 41st Annual Technical Meeting of the Institute of Environmental Sciences - Anaheim, CA, USA Duration: Apr 30 1995 → May 5 1995

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@article{47996258bdb24cc1b2d5ce54efbdc872,

title = "Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films",

abstract = "We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.",

author = "Ziemann, {Paul J.} and Peng Liu and Sandeep Nijhawan and Kittelson, {David B} and McMurry, {Peter H} and Campbell, {Stephen A}",

year = "1995",

language = "English (US)",

pages = "22--29",

journal = "Institute of Environmental Sciences - Proceedings, Annual Technical Meeting",

issn = "0073-9227",

note = "Proceedings of the 41st Annual Technical Meeting of the Institute of Environmental Sciences ; Conference date: 30-04-1995 Through 05-05-1995",

}

TY - JOUR

T1 - Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films

AU - Ziemann, Paul J.

AU - Liu, Peng

AU - Nijhawan, Sandeep

AU - Kittelson, David B

AU - McMurry, Peter H

AU - Campbell, Stephen A

PY - 1995

Y1 - 1995

N2 - We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.

AB - We have recently developed a particle beam mass spectrometer that can be used to size and detect ultrafine particles (approximately 0.01-0.5 μm) in low-pressure environments, such as those often encountered in semiconductor processing equipment. The instrument can be used as a particle detector in process control, and as a toll for investigating particle formation in processing equipment. In this paper we describe the operation of the instrument and the techniques used for calibration, data analysis, and measurements of particle size distributions. We also present the results of recent investigations of particle formation during LPCVD of polysilicon films.

UR - http://www.scopus.com/inward/record.url?scp=0029508085&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0029508085&partnerID=8YFLogxK

M3 - Conference article

AN - SCOPUS:0029508085

SN - 0073-9227

SP - 22

EP - 29

JO - Institute of Environmental Sciences - Proceedings, Annual Technical Meeting

JF - Institute of Environmental Sciences - Proceedings, Annual Technical Meeting

T2 - Proceedings of the 41st Annual Technical Meeting of the Institute of Environmental Sciences

Y2 - 30 April 1995 through 5 May 1995

ER -

Particle beam mass spectrometry of submicron particles formed during LPCVD of polysilicon films

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