Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes

David H K Jackson, Masihhur R. Laskar, Shuyu Fang, Shenzhen Xu, Ryan G. Ellis, Xiaoqing Li, Mark Dreibelbis, Susan E. Babcock, Mahesh K. Mahanthappa, Dane Morgan, Robert J. Hamers, Thomas F. Kuech

Research output: Contribution to journalArticlepeer-review

21 Scopus citations

Fingerprint

Dive into the research topics of 'Optimizing AlF<sub>3</sub> atomic layer deposition using trimethylaluminum and TaF<sub>5</sub>: Application to high voltage Li-ion battery cathodes'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds