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Optimizing AlF3 atomic layer deposition using trimethylaluminum and TaF5: Application to high voltage Li-ion battery cathodes
David H K Jackson, Masihhur R. Laskar, Shuyu Fang, Shenzhen Xu, Ryan G. Ellis, Xiaoqing Li, Mark Dreibelbis, Susan E. Babcock, Mahesh K. Mahanthappa, Dane Morgan, Robert J. Hamers, Thomas F. Kuech
Research output: Contribution to journal › Article › peer-review
27
Scopus
citations