Optical characterization of van der Waals materials via near-field microscopy

Daniel Wintz, Alexander Y. Zhu, Ke Wang, Antonio Ambrosio, Rob Devlin, Jesse Crossno, Philip Kim, Federico Capasso

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

We demonstrate a novel characterization method of van-der-Waals' materials by performing near-field-microscopy of hexagonal-boron-nitride thin films on single-crystal silver. Beyond determining dispersion of optical modes, this technique also enables the direct study of light-matter interactions.

Original languageEnglish (US)
Title of host publication2016 Conference on Lasers and Electro-Optics, CLEO 2016
PublisherInstitute of Electrical and Electronics Engineers Inc.
ISBN (Electronic)9781943580118
StatePublished - Dec 16 2016
Event2016 Conference on Lasers and Electro-Optics, CLEO 2016 - San Jose, United States
Duration: Jun 5 2016Jun 10 2016

Publication series

Name2016 Conference on Lasers and Electro-Optics, CLEO 2016

Other

Other2016 Conference on Lasers and Electro-Optics, CLEO 2016
CountryUnited States
CitySan Jose
Period6/5/166/10/16

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  • Cite this

    Wintz, D., Zhu, A. Y., Wang, K., Ambrosio, A., Devlin, R., Crossno, J., Kim, P., & Capasso, F. (2016). Optical characterization of van der Waals materials via near-field microscopy. In 2016 Conference on Lasers and Electro-Optics, CLEO 2016 [7789238] (2016 Conference on Lasers and Electro-Optics, CLEO 2016). Institute of Electrical and Electronics Engineers Inc..