On the oxidation-reduction kinetics of palladium

G. Veser, A. Wright, R. Caretta

Research output: Contribution to journalArticlepeer-review

26 Scopus citations


The oxidation-reduction kinetics of Pd was investigated on polycrystalline Pd foils using XPS and sputter-depth profiling over a wide range of temperatures. The observed behavior can be explained in terms of a desorption-controlled process at lower temperatures (T < 230°C) and a diffusion-controlled process at higher temperatures (T > 450°C). In the intermediate range (230 < T < 450°C) a transition between the two processes is observed which gives rise to a pronounced shoulder in the reduction time trace. The interpretation is qualitatively confirmed using a simple mathematical model for a coupled bulk diffusion/surface reaction system.

Original languageEnglish (US)
Pages (from-to)199-206
Number of pages8
JournalCatalysis Letters
Issue number4
StatePublished - Apr 1999


  • Oxidation-reduction
  • Palladium
  • Reaction-diffusion model
  • Sputter-depth profiling
  • XPS

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