Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications

Julia D. Cushen, Issei Otsuka, Christopher M. Bates, Sami Halila, Sébastien Fort, Cyrille Rochas, Jeffrey A. Easley, Erica L. Rausch, Anthony Thio, Redouane Borsali, C. Grant Willson, Christopher J. Ellison

Research output: Contribution to journal › Article › peer-review

183 Scopus citations

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