Nucleation Effects in the Atomic Layer Deposition of Nickel–Aluminum Oxide Thin Films

Material Science

• Film 100%
• Nucleation 100%
• Oxide Compound 100%
• Thin Films 100%
• Phase Composition 100%
• Oxide Film 33%
• Density 33%
• Electronic Property 33%
• Optical Property 33%
• Physical Property 33%
• Gel Permeation Chromatography 33%
• Aluminum Oxide 33%
• Surface (Surface Science) 33%
• Perovskite Solar Cell 33%

Keyphrases

• Oxide Thin Films 100%
• Atomic Layer Deposition 100%
• Nucleation Effect 100%
• Al Doping 33%
• Nickelocene 33%
• Ternary Material 33%
• Electronic Properties 16%
• Perovskite 16%
• Crystallinity 16%
• Oxide Film 16%
• Physical Properties 16%
• Optical Properties 16%
• Fill Factor 16%
• Aluminum Oxide 16%
• Trimethylaluminum 16%
• Deposited Film 16%
• Sub-nanometer 16%
• Power Conversion Efficiency 16%
• Reduced Density 16%
• Transport Layer 16%
• Selective Transport 16%
• Supercycle 16%
• Al-doped 16%
• Hole-selective 16%
• Perovskite Solar Cells (PeSCs) 16%
• Lead-free Perovskites 16%
• Growth per Cycle 16%
• NiO Films 16%
• Doped NiO 16%