Abstract
Hot carrier injection (HCI) is one of the critical de-vice degradation mechanisms, and is conventionally characterized with constant voltage stress (CVS) method. A novel voltage-step stress (VSS) methodology is pro-posed to quickly characterize HCI degradation, based on a simplified reaction-diffusion model. This wafer-level reliability qualification methodology for HCI requires only one single device, and the total test time can be con-trolled within 2 hours. Therefore, this new technique can be an effective tool for fast reliability screening for HCI during process development in the future.
Original language | English (US) |
---|---|
Title of host publication | Proceedings - 2014 IEEE 12th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 |
Editors | Jia Zhou, Ting-Ao Tang |
Publisher | Institute of Electrical and Electronics Engineers Inc. |
ISBN (Electronic) | 9781479932962 |
DOIs | |
State | Published - Jan 23 2014 |
Externally published | Yes |
Event | 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 - Guilin, China Duration: Oct 28 2014 → Oct 31 2014 |
Publication series
Name | Proceedings - 2014 IEEE 12th International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 |
---|
Conference
Conference | 2014 12th IEEE International Conference on Solid-State and Integrated Circuit Technology, ICSICT 2014 |
---|---|
Country/Territory | China |
City | Guilin |
Period | 10/28/14 → 10/31/14 |
Bibliographical note
Publisher Copyright:© 2014 IEEE.