Nanostructured silicon formations as a result of ionized N₂ gas reactions on silicon with native oxide layers

The formation of nanostructured silicon, by the reaction between ionized nitrogen and silicon was discussed. The nanocrystalline silicon formation and nanostructured surface modification method, using the ionized gases were found to be simple and efficient methods. The optical properties, surface morphology and electronic structure of the nanostructured silicon were also discussed.