Nanoscale Patterning of Colloidal Nanocrystal Films for Nanophotonic Applications Using Direct Write Electron Beam Lithography

Keyphrases

• Direct Ink Writing 100%
• Quantum Dots 100%
• Electron Beam Lithography 100%
• Colloidal Nanocrystals 100%
• Pattern-based Approach 100%
• Nanophotonic Applications 100%
• Nanocrystal Films 100%
• Nanopatterning 100%
• Nanophotonics 66%
• Quantum Dot Film 66%
• Quantum Dot Structures 66%
• Quantum Dot Material 66%
• Self-assembled Monolayer 33%
• Complex Structure 33%
• Further Processing 33%
• Processing Stages 33%
• Optical Properties 33%
• Size-and-shape 33%
• Photoluminescence 33%
• Ligand Exchange 33%
• Edge Effect 33%
• Solid Properties 33%
• Absorption Cross Section 33%
• Multiple Layers 33%
• Equivalent Volume 33%
• Nanocrystal Quantum Dots 33%
• Absorption Enhancement 33%
• Device Construction 33%
• Tunable Photoluminescence 33%
• Octadecyltrichlorosilane 33%
• Quantum Dot Arrays 33%
• Placement Accuracy 33%
• Multiple Quantum Dots 33%
• Complex Refractive Index 33%
• Multilayer Quantum Dot 33%
• Plasmonic Resonator 33%
• Tall Buildings 33%
• Quantum Dot Nanostructure 33%
• Direct Patterning 33%
• Scattering Cross Section 33%
• Quantum Dot Synthesis 33%

Engineering

• Electron Optical Lithography 100%
• Quantum Dot 100%
• Nanoscale 100%
• Patterning Method 14%
• Self-Assembled Monolayers 7%
• Plasmonics 7%
• Limitations 7%
• Patterning Process 7%
• Resonator 7%
• Processing Step 7%
• Feature Size 7%
• Absorption Cross 7%
• Complex Structure 7%
• Octadecyltrichlorosilane 7%
• Dot Layer 7%
• Equivalent Volume 7%
• Placement Accuracy 7%
• Refractive Index 7%
• Nanomaterial 7%
• Edge Effect 7%
• Sonication 7%
• Refractivity 7%
• Scattering Cross Section 7%

Material Science

• Lithography 100%
• Quantum Dot 100%
• Film 14%
• Photoluminescence 14%
• Self Assembled Monolayer 7%
• Optical Property 7%
• Refractive Index 7%
• Resonator 7%
• Nanostructure 7%