Nanoindentation evaluation of passive film stress and growth kinetics

N. I. Tymiak, J. C. Nelson, William W Gerberich, D. F. Bahr

Research output: Contribution to journalConference articlepeer-review

Abstract

Load controlled nanoindentation in conjunction with a potential step method were utilized for the investigation of precipitated iron sulfate film stresses and growth. Two types of experiments have been undertaken on thin sheet samples of Fe 3% Si single crystal in 1 M H2SO4. Samples were either allowed to deflect in the indentation direction or constrained. A distinctive difference between the indentation curves for the above two types of tests allowed separation of the effects of film stresses and local electrochemical processes. A proposed theoretical model accounting for both electrochemical and mechanical effects allowed modeling of the indenter tip motion following a potential step. Within the scope of the model, the time dependent film thickness (3.5 μm at maximum), electrostrictive film stress (330 MPa at maximum) have been determined.

Original languageEnglish (US)
Pages (from-to)251-256
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume522
StatePublished - 1998
EventProceedings of the 1998 MRS Spring Symposium - San Francisco, CA, USA
Duration: Apr 13 1998Apr 15 1998

Fingerprint

Dive into the research topics of 'Nanoindentation evaluation of passive film stress and growth kinetics'. Together they form a unique fingerprint.

Cite this