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Multiple steady states in a radio frequency chlorine glow discharge
Eray S. Aydil, Demetre J. Economou
Chemical Engineering and Materials Science
Research output
:
Contribution to journal
›
Article
›
peer-review
17
Scopus citations
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Keyphrases
Radio Frequency
100%
Multiple Steady States
100%
Chlorine
100%
Etching Rate
100%
Chlorine Concentration
100%
Glow Discharge
100%
Plasmoid
100%
Concentration Profile
66%
Noble Gases
33%
High Pressure
33%
High Power
33%
Two-state
33%
Operating Conditions
33%
Central Region
33%
Parallel Plates
33%
Multiple States
33%
Electronegative
33%
Energy Distribution
33%
Flux Distribution
33%
Positive Ions
33%
Concentration Rate
33%
Polysilicon
33%
Electrode Spacing
33%
Atomic Chlorine
33%
Radial Profile
33%
Radial Flow Reactor
33%
One-state Reality
33%
Engineering
Etch Rate
100%
Multiple Steady State
100%
Radio Frequency
100%
Glow Discharge
100%
Concentration Profile
66%
Central Region
33%
Flow Reactor
33%
Bombarding Ion
33%
Energy Distribution
33%
Radial Flow
33%
Parallel Plate
33%
Polysilicon
33%
Physics
Glow Discharge
100%
Steady State
100%
Blood Plasma
100%
Plasma Physics
75%
Parallel Plate
25%
Noble Gas
25%
Rare Gas
25%
Energy Distribution
25%
Positive Ion
25%
Radial Flow
25%
Chemical Engineering
Radial Flow Reactor
100%