Multiple layer techniques in optical lithography: Applications to fine line mos production

M. A. Listvan, A. Swanson, A. Wall, S. A. Campbell

Research output: Contribution to journalArticlepeer-review

5 Scopus citations

Abstract

The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.

Original languageEnglish (US)
Pages (from-to)85-91
Number of pages7
JournalProceedings of SPIE - The International Society for Optical Engineering
Volume470
DOIs
StatePublished - Jun 29 1984

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