TY - JOUR
T1 - Multiple layer techniques in optical lithography
T2 - Applications to fine line mos production
AU - Listvan, M. A.
AU - Swanson, A.
AU - Wall, A.
AU - Campbell, S. A.
PY - 1984/6/29
Y1 - 1984/6/29
N2 - The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.
AB - The theory and practical concerns of multi-layer techniques using an anti-reflective polymer coating will be discussed. Anti Reflective Coating (ARC, Brewer Science, Inc.) was incorporated into the metal lithography process for a 1.2 micron gate CMOS prototype production line. Previously, reflections from substrate topography had caused a loss in linewidth control. These reflections were minimized by the ARC, which also restored process latitude. For the process described, ARC coating uniformity was nm, adhesion was good, and step coverage was seen to be adequate to 0.8 micron high verticle wall steps.
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U2 - 10.1117/12.941894
DO - 10.1117/12.941894
M3 - Article
AN - SCOPUS:0021626639
SN - 0277-786X
VL - 470
SP - 85
EP - 91
JO - Proceedings of SPIE - The International Society for Optical Engineering
JF - Proceedings of SPIE - The International Society for Optical Engineering
ER -