Keyphrases
Plasma Etching
100%
Surface Layer
100%
Pattern-based Approach
100%
L10-FePt
100%
Ion Energy
100%
FePt Media
100%
Molecular Dynamics Simulation Study
100%
Ar Ions
66%
He Ions
66%
Interstitial Defects
66%
Molecular Dynamics Simulation
33%
Magnetic Properties
33%
Single Crystal
33%
Interatomic Potential
33%
FePt
33%
Defected Ground Structure
33%
Etchant
33%
Metal Atoms
33%
Ion Range
33%
Plasma Etching Process
33%
FePt Alloy
33%
Embedded Atom Method
33%
Dead Layer Thickness
33%
Magnetic Dead Layer
33%
Defect Levels
33%
Lennard-Jones (12-6) Potential
33%
Property Loss
33%
Low Energy Level
33%
Ion Impact
33%
Defect Depth
33%
Pergamon
33%
Etching Gas
33%
Energy Defect
33%
Interstitial Point Defect
33%
Lattice Surface
33%
Physics
Molecular Dynamics
100%
Surface Layers
100%
Plasma Etching
100%
Helium Ion
66%
Interstitial Defect
66%
Point Defect
33%
Lennard-Jones
33%
Single Crystal
33%
Embedded Atom Method
33%
Magnetic Property
33%
Crystal Defect
33%
Engineering
Patterning Process
100%
Ion Energy
100%
Surface Layers
100%
Layer Thickness
33%
Etching Process
33%
Metal Atom
33%
Defect Structure
33%
Interatomic Potential
33%
Energy Defect
33%
Material Science
Plasma Etching
100%
Surface (Surface Science)
100%
Interstitial Defect
50%
Magnetic Property
25%
Point Defect
25%
Single Crystal
25%
Crystal Defect
25%