a detailed silicon oxide clustering mechanism in low-pressure silane-oxygen-argon plasmas was developed. An inductively coupled plasma reactor was modeled by constructing a set of one-dimensional conservation equations for mass, momentum, and energy within a multicomponent two-temperature framework. As such, the primary pathways and major contributing processes to clustering were identified.
|Original language||English (US)|
|Number of pages||14|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|State||Published - Jan 1 2003|