Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmas

S. M. Suh; S. L. Girshick; U. R. Kortshagen; M. R. Zachariah

doi:10.1116/1.1531143

Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmas

S. M. Suh, S. L. Girshick, U. R. Kortshagen, M. R. Zachariah

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

17 Scopus citations

Abstract

a detailed silicon oxide clustering mechanism in low-pressure silane-oxygen-argon plasmas was developed. An inductively coupled plasma reactor was modeled by constructing a set of one-dimensional conservation equations for mass, momentum, and energy within a multicomponent two-temperature framework. As such, the primary pathways and major contributing processes to clustering were identified.

Original language	English (US)
Pages (from-to)	251-264
Number of pages	14
Journal	Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume	21
Issue number	1
DOIs	https://doi.org/10.1116/1.1531143
State	Published - Jan 2003

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abstract = "a detailed silicon oxide clustering mechanism in low-pressure silane-oxygen-argon plasmas was developed. An inductively coupled plasma reactor was modeled by constructing a set of one-dimensional conservation equations for mass, momentum, and energy within a multicomponent two-temperature framework. As such, the primary pathways and major contributing processes to clustering were identified.",

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Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmas

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