Modeling gas-phase nucleation in inductively coupled silane-oxygen plasmas

S. M. Suh, S. L. Girshick, U. R. Kortshagen, M. R. Zachariah

Research output: Contribution to journalArticle

16 Scopus citations

Abstract

a detailed silicon oxide clustering mechanism in low-pressure silane-oxygen-argon plasmas was developed. An inductively coupled plasma reactor was modeled by constructing a set of one-dimensional conservation equations for mass, momentum, and energy within a multicomponent two-temperature framework. As such, the primary pathways and major contributing processes to clustering were identified.

Original languageEnglish (US)
Pages (from-to)251-264
Number of pages14
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume21
Issue number1
DOIs
StatePublished - Jan 1 2003

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