Model polymer etching and surface modification by a time modulated RF plasma jet: Role of atomic oxygen and water vapor

P. Luan, A. J. Knoll, H. Wang, V. S.S.K. Kondeti, P. J. Bruggeman, G. S. Oehrlein

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Fingerprint

Dive into the research topics of 'Model polymer etching and surface modification by a time modulated RF plasma jet: Role of atomic oxygen and water vapor'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds