Mo and W doping effects on CoCrPt thin films

Ding Jin; Jian Ping Wang; Qionghui Han; Hao Gong

doi:10.1016/S0928-4931(01)00279-X

Mo and W doping effects on CoCrPt thin films

Ding Jin
, Jian Ping Wang
, Qionghui Han
, Hao Gong

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

Abstract

Mo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (H_c) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed.

Original language	English (US)
Pages (from-to)	75-79
Number of pages	5
Journal	Materials Science and Engineering C
Volume	16
Issue number	1-2
DOIs	https://doi.org/10.1016/S0928-4931(01)00279-X
State	Published - Oct 20 2001

Keywords

Coercivity
Doping
Mo
S
Segregation
W

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10.1016/S0928-4931(01)00279-X

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title = "Mo and W doping effects on CoCrPt thin films",

abstract = "Mo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (Hc) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed.",

keywords = "Coercivity, Doping, Mo, S, Segregation, W",

author = "Ding Jin and Wang, \{Jian Ping\} and Qionghui Han and Hao Gong",

year = "2001",

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TY - JOUR

T1 - Mo and W doping effects on CoCrPt thin films

AU - Jin, Ding

AU - Wang, Jian Ping

AU - Han, Qionghui

AU - Gong, Hao

PY - 2001/10/20

Y1 - 2001/10/20

N2 - Mo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (Hc) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed.

AB - Mo and W doping CoCrPt-based magnetic thin films were fabricated by means of DC magnetron sputtering method. It was observed that a small amount of Mo and W doping could increase coercivity (Hc) and, at the same time, maintain a lower Pt concentration. The roles of Mo and W were analyzed on the basis of structural and magnetic properties. The study reveals that W was more likely to distribute at the grain boundaries and Mo was comparably randomly distributed.

KW - Coercivity

KW - Doping

KW - Mo

KW - S

KW - Segregation

KW - W

UR - https://www.scopus.com/pages/publications/0035922717

UR - https://www.scopus.com/pages/publications/0035922717#tab=citedBy

U2 - 10.1016/S0928-4931(01)00279-X

DO - 10.1016/S0928-4931(01)00279-X

M3 - Article

AN - SCOPUS:0035922717

SN - 0928-4931

VL - 16

SP - 75

EP - 79

JO - Materials Science and Engineering C

JF - Materials Science and Engineering C

IS - 1-2

ER -

Mo and W doping effects on CoCrPt thin films

Abstract

Keywords

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