Abstract
Two different sputtering modes, co-sputtering and multilayer-sputtering, were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain patterns and grains are more uniformly distributed in the co-sputtered granular films compared to in multilayer-sputtered ones. This difference in the microstructure is explained to be attributed to the more randomly distributed Ag atoms in the co-sputtered films. Further study on in-depth defects in these films confirms this explanation.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 1879-1881 |
| Number of pages | 3 |
| Journal | Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering |
| Volume | 34 |
| Issue number | 12 |
| State | Published - Dec 2005 |
Keywords
- Co-sputtering
- FePt:Ag granular films
- Microstructure
- Multilayer-sputtering