TY - JOUR
T1 - Micromachining of highly reproducible step substrates for high Tc step junction dc-SQUIDs
AU - Wang, J.
AU - Han, B.
AU - Chen, G.
AU - Yang, Q.
AU - Cui, T.
PY - 2003/9
Y1 - 2003/9
N2 - A means to successfully fabricate highly reproducible SrTiO3 step substrates for high Tc dc-Supercon-ducting Quantum Interference Devices (dc-SQUIDs) by micromachining is reported in this paper. At optimized Ar ion milling conditions, an inclined angle from 45 to 50° and a laid angle from 30 to 45°, the highest step angles can be obtained. Under strict process control, the profile of the Nb mask film is clean and sharp. The fabricated step angles are about 71° with steep and flawless topography. The step substrate yield for YBa2Cu3O7-x Josephson step edge junction dc-SQUIDs is 75%. The variation of junction resistance and critical current is ±28.6% and ±42.4% respectively.
AB - A means to successfully fabricate highly reproducible SrTiO3 step substrates for high Tc dc-Supercon-ducting Quantum Interference Devices (dc-SQUIDs) by micromachining is reported in this paper. At optimized Ar ion milling conditions, an inclined angle from 45 to 50° and a laid angle from 30 to 45°, the highest step angles can be obtained. Under strict process control, the profile of the Nb mask film is clean and sharp. The fabricated step angles are about 71° with steep and flawless topography. The step substrate yield for YBa2Cu3O7-x Josephson step edge junction dc-SQUIDs is 75%. The variation of junction resistance and critical current is ±28.6% and ±42.4% respectively.
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U2 - 10.1007/s00542-002-0278-3
DO - 10.1007/s00542-002-0278-3
M3 - Article
AN - SCOPUS:0242664117
SN - 0946-7076
VL - 9
SP - 480
EP - 483
JO - Microsystem Technologies
JF - Microsystem Technologies
IS - 6-7
ER -
