Micromachined infrared detectors based on pyroelectric thin films

Dennis L. Polla, P. F. Baude, L. Pham, Q. Mei, J. R. Choi, Chian Ping Ye, L. F. Francis, Tho T. Vu

Research output: Chapter in Book/Report/Conference proceedingConference contribution

6 Scopus citations

Abstract

Solid-state micromachining techniques have been used in the fabrication of low-stress silicon nitride thermal isolation structures for pyroelectric detectors. Thin films of PbTiO 3 and other related perovskite materials are integrated on these structures. Process compatibility with NMOS electronics is demonstrated.

Original languageEnglish (US)
Title of host publicationProceedings of SPIE - The International Society for Optical Engineering
EditorsBjorn F. Andresen, Marija S. Scholl
Pages602-611
Number of pages10
Edition2
StatePublished - 1995
EventInfrared Technology XXI. Part 1 (of 2) - San Diego, CA, USA
Duration: Jul 9 1995Jul 13 1995

Publication series

NameProceedings of SPIE - The International Society for Optical Engineering
Number2
Volume2552
ISSN (Print)0277-786X

Other

OtherInfrared Technology XXI. Part 1 (of 2)
CitySan Diego, CA, USA
Period7/9/957/13/95

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