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Metallicity and anomalous Hall effect in epitaxially strained, atomically thin RuO2 films

  • Seung Gyo Jeong
  • , Seungjun Lee
  • , Bonnie Lin
  • , Zhifei Yang
  • , In Hyeok Choi
  • , Jin Young Oh
  • , Sehwan Song
  • , Seung Wook Lee
  • , Sreejith Nair
  • , Rashmi Choudhary
  • , Juhi Parikh
  • , Sungkyun Park
  • , Woo Seok Choi
  • , Jong Seok Lee
  • , James M. LeBeau
  • , Tony Low
  • , Bharat Jalan

Research output: Contribution to journal › Article › peer-review

Abstract

The anomalous Hall effect (AHE), a hallmark of time-reversal symmetry breaking, has been reported in rutile RuO2, a debated metallic altermagnetic candidate. Previously, AHE in RuO2 was observed only in strain-relaxed thick films under extremely high magnetic fields (~50 T). Yet, in ultrathin strained films with distinctive anisotropic electronic structures, there are no reports, likely due to disorder and defects suppressing metallicity thus hindering its detection. Here, we demonstrate that ultrathin, fully strained 2 nm TiO2/t nm RuO2/TiO2 (110) heterostructures, grown by hybrid molecular beam epitaxy, retain metallicity and exhibit a sizeable AHE at a significantly lower magnetic field (< 9 T). Density functional theory calculations reveal that epitaxial strain stabilizes a noncompensated magnetic ground state and reconfigures magnetic ordering in RuO2 (110) thin films. These findings establish ultrathin RuO2 as a platform for strain-engineered magnetism and underscore the transformative potential of epitaxial design in advancing spintronic technologies.

Original languageEnglish (US)
Article numbere2500831122
JournalProceedings of the National Academy of Sciences of the United States of America
Volume122
Issue number24
DOIs
StatePublished - Jun 17 2025

Bibliographical note

Publisher Copyright:
Copyright © 2025 the Author(s).

Keywords

  • altermagnetism
  • MBE
  • RuO
  • strain engineering
  • thin films

MRSEC Support

  • Partial

PubMed: MeSH publication types

  • Journal Article

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