Materials for Two-Photon 3D Lithography

Joseph W. Perry; Sundaravel Ananthavel; Kevin Cammack; Stephen M. Kuebler; Seth R. Marder; Mariacristina Rurni; Brian H. Cumpston; Ahmed A. Heikal; Jeffrey E. Ehrlich; Lael L. Erskine; Michael D. Levin; Matthew Lipson; Diane McCord-Maughon; Harald Rockel

Materials for Two-Photon 3D Lithography

Joseph W. Perry, Sundaravel Ananthavel, Kevin Cammack, Stephen M. Kuebler, Seth R. Marder, Mariacristina Rurni, Brian H. Cumpston, Ahmed A. Heikal, Jeffrey E. Ehrlich, Lael L. Erskine, Michael D. Levin, Matthew Lipson, Diane McCord-Maughon, Harald Rockel

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

1 Scopus citations

Abstract

Conjugated organic chromophores with large two-photon absorption cross-sections have been developed and employed to prepare highly-sensitive nonlinear photopolymer systems, which can be used for 3D-microfabrication and optical data storage.

Original language	English (US)
Title of host publication	Organic Thin Films, OTF 1999
Publisher	Optica Publishing Group (formerly OSA)
Pages	174-177
Number of pages	4
ISBN (Electronic)	1557525897
State	Published - 1999
Externally published	Yes
Event	Organic Thin Films, OTF 1999 - Santa Clara, United States Duration: Sep 24 1999 → Sep 24 1999

Publication series

Name	Optics InfoBase Conference Papers
ISSN (Electronic)	2162-2701

Conference

Conference	Organic Thin Films, OTF 1999
Country/Territory	United States
City	Santa Clara
Period	9/24/99 → 9/24/99

Bibliographical note

Publisher Copyright:
© 1999 OSA - The Optical Society. All rights reserved.

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Perry, J. W., Ananthavel, S., Cammack, K., Kuebler, S. M., Marder, S. R., Rurni, M., Cumpston, B. H., Heikal, A. A., Ehrlich, J. E., Erskine, L. L., Levin, M. D., Lipson, M., McCord-Maughon, D., & Rockel, H. (1999). Materials for Two-Photon 3D Lithography. In Organic Thin Films, OTF 1999 (pp. 174-177). Article SuB1 (Optics InfoBase Conference Papers). Optica Publishing Group (formerly OSA).

Perry, JW, Ananthavel, S, Cammack, K, Kuebler, SM, Marder, SR, Rurni, M, Cumpston, BH, Heikal, AA, Ehrlich, JE, Erskine, LL, Levin, MD, Lipson, M, McCord-Maughon, D & Rockel, H 1999, Materials for Two-Photon 3D Lithography. in Organic Thin Films, OTF 1999., SuB1, Optics InfoBase Conference Papers, Optica Publishing Group (formerly OSA), pp. 174-177, Organic Thin Films, OTF 1999, Santa Clara, United States, 9/24/99.

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title = "Materials for Two-Photon 3D Lithography",

abstract = "Conjugated organic chromophores with large two-photon absorption cross-sections have been developed and employed to prepare highly-sensitive nonlinear photopolymer systems, which can be used for 3D-microfabrication and optical data storage.",

author = "Perry, {Joseph W.} and Sundaravel Ananthavel and Kevin Cammack and Kuebler, {Stephen M.} and Marder, {Seth R.} and Mariacristina Rurni and Cumpston, {Brian H.} and Heikal, {Ahmed A.} and Ehrlich, {Jeffrey E.} and Erskine, {Lael L.} and Levin, {Michael D.} and Matthew Lipson and Diane McCord-Maughon and Harald Rockel",

year = "1999",

language = "English (US)",

series = "Optics InfoBase Conference Papers",

publisher = "Optica Publishing Group (formerly OSA)",

pages = "174--177",

booktitle = "Organic Thin Films, OTF 1999",

}

TY - GEN

T1 - Materials for Two-Photon 3D Lithography

AU - Perry, Joseph W.

AU - Ananthavel, Sundaravel

AU - Cammack, Kevin

AU - Kuebler, Stephen M.

AU - Marder, Seth R.

AU - Rurni, Mariacristina

AU - Cumpston, Brian H.

AU - Heikal, Ahmed A.

AU - Ehrlich, Jeffrey E.

AU - Erskine, Lael L.

AU - Levin, Michael D.

AU - Lipson, Matthew

AU - McCord-Maughon, Diane

AU - Rockel, Harald

PY - 1999

Y1 - 1999

N2 - Conjugated organic chromophores with large two-photon absorption cross-sections have been developed and employed to prepare highly-sensitive nonlinear photopolymer systems, which can be used for 3D-microfabrication and optical data storage.

AB - Conjugated organic chromophores with large two-photon absorption cross-sections have been developed and employed to prepare highly-sensitive nonlinear photopolymer systems, which can be used for 3D-microfabrication and optical data storage.

UR - http://www.scopus.com/inward/record.url?scp=4243617364&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=4243617364&partnerID=8YFLogxK

M3 - Conference contribution

AN - SCOPUS:4243617364

T3 - Optics InfoBase Conference Papers

SP - 174

EP - 177

BT - Organic Thin Films, OTF 1999

PB - Optica Publishing Group (formerly OSA)

T2 - Organic Thin Films, OTF 1999

Y2 - 24 September 1999 through 24 September 1999

ER -

Materials for Two-Photon 3D Lithography

Abstract

Publication series

Conference

Bibliographical note

UN SDGs

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