Materials for Two-Photon 3D Lithography

Joseph W. Perry, Sundaravel Ananthavel, Kevin Cammack, Stephen M. Kuebler, Seth R. Marder, Mariacristina Rurni, Brian H. Cumpston, Ahmed A. Heikal, Jeffrey E. Ehrlich, Lael L. Erskine, Michael D. Levin, Matthew Lipson, Diane McCord-Maughon, Harald Rockel

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations


Conjugated organic chromophores with large two-photon absorption cross-sections have been developed and employed to prepare highly-sensitive nonlinear photopolymer systems, which can be used for 3D-microfabrication and optical data storage.

Original languageEnglish (US)
Title of host publicationOrganic Thin Films, OTF 1999
PublisherOptica Publishing Group (formerly OSA)
Number of pages4
ISBN (Electronic)1557525897
StatePublished - 1999
Externally publishedYes
EventOrganic Thin Films, OTF 1999 - Santa Clara, United States
Duration: Sep 24 1999Sep 24 1999

Publication series

NameOptics InfoBase Conference Papers
ISSN (Electronic)2162-2701


ConferenceOrganic Thin Films, OTF 1999
Country/TerritoryUnited States
CitySanta Clara

Bibliographical note

Publisher Copyright:
© 1999 OSA - The Optical Society. All rights reserved.


Dive into the research topics of 'Materials for Two-Photon 3D Lithography'. Together they form a unique fingerprint.

Cite this