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Maintaining reproducible plasma reactor wall conditions: SF6 plasma cleaning of films deposited on chamber walls during Cl2/O2 plasma etching of Si

  • Saurabh J. Ullal
  • , Harmeet Singh
  • , John Daugherty
  • , Vahid Vahedi
  • , Eray S. Aydil

Research output: Contribution to journal › Article › peer-review

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