Magnetic Nanostructures Produced by Electron Beam Direct Writing

J. P. Wang; Y. Zhao; T. J. Zhou; J. T L Thong; T. C. Chong

doi:10.1557/proc-777-t4.13

Magnetic Nanostructures Produced by Electron Beam Direct Writing

J. P. Wang, Y. Zhao, T. J. Zhou, J. T L Thong, T. C. Chong

Electrical and Computer Engineering

Research output: Contribution to journal › Conference article › peer-review

Abstract

We present a method of direct magnetic patterning of nonmagnetic CoC and CoTaC films by electron irradiation-induced nano-scale phase transition. Co _xC_1-x (0.4<X<0.8) films were prepared by co-sputtering. The as-deposited films with Co concentration less than 60% are amorphous and non-ferromagnetic. All films become ferromagnetic after annealing. Doping Ta into the CoC films can enhance the segregation of Co and C and therefore reduce the phase transition temperature. It is found that the magnetic properties of annealed (Co₆₀C₄₀)₉₇ Ta₃ films are much better than that of annealed Co₆₀C ₄₀ films at the same annealing condition. Magnetic nano-patteming (dot/line array) of the as-deposited CoC and Co(TaC) films was realized by subjecting them to electron irradiation using a focused 30keV electron beam with a current of 7.1 nA and dwell time per dot of 0.75 to 15.2 seconds. A 250nm magnetic dot/line array was produced by this method. It was also found that the time required to magnetically pattern non-magnetic (Co ₆₀C₄₀)₉₇Ta₃ thin films (0.75 seconds) is much shorter than that required for Co₆₀C₄₀ Films (3.8 seconds). The present method of magnetically patterning a nonmagnetic film has the potential application for nanoscale solid magnetic devices.

Original language	English (US)
Pages (from-to)	65-70
Number of pages	6
Journal	Materials Research Society Symposium - Proceedings
Volume	777
DOIs	https://doi.org/10.1557/proc-777-t4.13
State	Published - 2003
Event	Nanostructuring Materials with Energetic Beams - San Francisco, CA, United States Duration: Apr 22 2003 → Apr 23 2003

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@article{8bc1f9da67284daf87c4773aa4ec956d,

title = "Magnetic Nanostructures Produced by Electron Beam Direct Writing",

abstract = "We present a method of direct magnetic patterning of nonmagnetic CoC and CoTaC films by electron irradiation-induced nano-scale phase transition. Co xC1-x (0.4<X<0.8) films were prepared by co-sputtering. The as-deposited films with Co concentration less than 60% are amorphous and non-ferromagnetic. All films become ferromagnetic after annealing. Doping Ta into the CoC films can enhance the segregation of Co and C and therefore reduce the phase transition temperature. It is found that the magnetic properties of annealed (Co60C40)97 Ta3 films are much better than that of annealed Co60C 40 films at the same annealing condition. Magnetic nano-patteming (dot/line array) of the as-deposited CoC and Co(TaC) films was realized by subjecting them to electron irradiation using a focused 30keV electron beam with a current of 7.1 nA and dwell time per dot of 0.75 to 15.2 seconds. A 250nm magnetic dot/line array was produced by this method. It was also found that the time required to magnetically pattern non-magnetic (Co 60C40)97Ta3 thin films (0.75 seconds) is much shorter than that required for Co60C40 Films (3.8 seconds). The present method of magnetically patterning a nonmagnetic film has the potential application for nanoscale solid magnetic devices.",

author = "Wang, {J. P.} and Y. Zhao and Zhou, {T. J.} and Thong, {J. T L} and Chong, {T. C.}",

year = "2003",

doi = "10.1557/proc-777-t4.13",

language = "English (US)",

volume = "777",

pages = "65--70",

journal = "Materials Research Society Symposium - Proceedings",

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TY - JOUR

T1 - Magnetic Nanostructures Produced by Electron Beam Direct Writing

AU - Wang, J. P.

AU - Zhao, Y.

AU - Zhou, T. J.

AU - Thong, J. T L

AU - Chong, T. C.

PY - 2003

Y1 - 2003

N2 - We present a method of direct magnetic patterning of nonmagnetic CoC and CoTaC films by electron irradiation-induced nano-scale phase transition. Co xC1-x (0.4<X<0.8) films were prepared by co-sputtering. The as-deposited films with Co concentration less than 60% are amorphous and non-ferromagnetic. All films become ferromagnetic after annealing. Doping Ta into the CoC films can enhance the segregation of Co and C and therefore reduce the phase transition temperature. It is found that the magnetic properties of annealed (Co60C40)97 Ta3 films are much better than that of annealed Co60C 40 films at the same annealing condition. Magnetic nano-patteming (dot/line array) of the as-deposited CoC and Co(TaC) films was realized by subjecting them to electron irradiation using a focused 30keV electron beam with a current of 7.1 nA and dwell time per dot of 0.75 to 15.2 seconds. A 250nm magnetic dot/line array was produced by this method. It was also found that the time required to magnetically pattern non-magnetic (Co 60C40)97Ta3 thin films (0.75 seconds) is much shorter than that required for Co60C40 Films (3.8 seconds). The present method of magnetically patterning a nonmagnetic film has the potential application for nanoscale solid magnetic devices.

AB - We present a method of direct magnetic patterning of nonmagnetic CoC and CoTaC films by electron irradiation-induced nano-scale phase transition. Co xC1-x (0.4<X<0.8) films were prepared by co-sputtering. The as-deposited films with Co concentration less than 60% are amorphous and non-ferromagnetic. All films become ferromagnetic after annealing. Doping Ta into the CoC films can enhance the segregation of Co and C and therefore reduce the phase transition temperature. It is found that the magnetic properties of annealed (Co60C40)97 Ta3 films are much better than that of annealed Co60C 40 films at the same annealing condition. Magnetic nano-patteming (dot/line array) of the as-deposited CoC and Co(TaC) films was realized by subjecting them to electron irradiation using a focused 30keV electron beam with a current of 7.1 nA and dwell time per dot of 0.75 to 15.2 seconds. A 250nm magnetic dot/line array was produced by this method. It was also found that the time required to magnetically pattern non-magnetic (Co 60C40)97Ta3 thin films (0.75 seconds) is much shorter than that required for Co60C40 Films (3.8 seconds). The present method of magnetically patterning a nonmagnetic film has the potential application for nanoscale solid magnetic devices.

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JO - Materials Research Society Symposium - Proceedings

JF - Materials Research Society Symposium - Proceedings

T2 - Nanostructuring Materials with Energetic Beams

Y2 - 22 April 2003 through 23 April 2003

ER -

Magnetic Nanostructures Produced by Electron Beam Direct Writing

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