Keyphrases
Silane Plasma
100%
Plasma Deposition
100%
A-Si
100%
Silicon Nitride
100%
Film Composition
100%
Film Structure
100%
Nitrogen Plasma
100%
Nitridation Rate
100%
Silicon Nitride Film
100%
Plasma Power
100%
Low-temperature Plasma
100%
Nitrogen N
50%
In Situ
50%
High Concentration
50%
Plasma Reactor
50%
In Films
50%
Silane
50%
Film Surface
50%
Control Parameters
50%
Attenuated Total reflectance-Fourier Transform Infrared Spectroscopy (ATR-FTIR)
50%
Plasma-enhanced Chemical Vapor Deposition (PECVD)
50%
High-pressure Conditions
50%
N2 Gas
50%
Helical Resonator
50%
Flux Rate
50%
Film Properties
50%
Nitrides
50%
Plasma Pressure
50%
Nitridation
50%
In Situ Spectroscopic Ellipsometry
50%
Active Nitrogen
50%
Material Science
Film
100%
Silane
100%
Silicon Nitride
100%
Plasma Deposition
100%
Nitriding
42%
Surface (Surface Science)
28%
Nitride Compound
14%
Resonator
14%
Plasma-Enhanced Chemical Vapor Deposition
14%
Fourier Transform Infrared Spectroscopy
14%