Low-cost shrink lithography with sub-22 nm resolution

A low-cost shrink lithogragphy technique with 21 nm resolution is presented in this paper. The shrink lithography uses embossing approach to pattern the heat-shrink polymer film, and thermally shrink the film as a shadow mask subsequently. Metal patterns with diffferent feature sizes were achieved from a single mold by shrink lithography through controlling the shrink contidions including temperature and force. A biosensor based on a suspended graphene nanoribbon is fabricated with the shrink lithography, demonstrating the potential application of this process to the fabrication of nanodevices and integrated circuits.