Low-cost shrink lithography with sub-22 nm resolution

Bo Zhang, Min Zhang, Tianhong Cui

Research output: Contribution to journalArticlepeer-review

7 Scopus citations


A low-cost shrink lithogragphy technique with 21 nm resolution is presented in this paper. The shrink lithography uses embossing approach to pattern the heat-shrink polymer film, and thermally shrink the film as a shadow mask subsequently. Metal patterns with diffferent feature sizes were achieved from a single mold by shrink lithography through controlling the shrink contidions including temperature and force. A biosensor based on a suspended graphene nanoribbon is fabricated with the shrink lithography, demonstrating the potential application of this process to the fabrication of nanodevices and integrated circuits.

Original languageEnglish (US)
Article number133113
JournalApplied Physics Letters
Issue number13
StatePublished - Mar 26 2012


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