Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films

Roberto Olayo-Valles, M. S. Lund, C. Leighton, Marc A. Hillmyer

Research output: Contribution to journalArticle

72 Citations (Scopus)

Abstract

Magnetic nanodot arrays were prepared from thin film templates of cylinder-forming polystyrene-polylactide diblock copolymers by first annealing the films to obtain PLA cylinders oriented perpendicular to the surface, then selectively staining the PS matrix with RuO4 vapors, followed by etching the cylinders by O2-reactive ion etching. Metal was then deposited by molecular beam deposition and finally the polymer mask was lifted off.

Original languageEnglish (US)
Pages (from-to)2729-2731
Number of pages3
JournalJournal of Materials Chemistry
Volume14
Issue number18
DOIs
StatePublished - Sep 21 2004

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Molecular beams
Polystyrenes
Reactive ion etching
block copolymers
Block copolymers
Masks
Etching
Polymers
templates
Metals
Vapors
etching
Annealing
Thin films
thin films
staining
molecular beams
polystyrene
copolymers
masks

Cite this

Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films. / Olayo-Valles, Roberto; Lund, M. S.; Leighton, C.; Hillmyer, Marc A.

In: Journal of Materials Chemistry, Vol. 14, No. 18, 21.09.2004, p. 2729-2731.

Research output: Contribution to journalArticle

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