Abstract
Magnetic nanodot arrays were prepared from thin film templates of cylinder-forming polystyrene-polylactide diblock copolymers by first annealing the films to obtain PLA cylinders oriented perpendicular to the surface, then selectively staining the PS matrix with RuO4 vapors, followed by etching the cylinders by O2-reactive ion etching. Metal was then deposited by molecular beam deposition and finally the polymer mask was lifted off.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 2729-2731 |
| Number of pages | 3 |
| Journal | Journal of Materials Chemistry |
| Volume | 14 |
| Issue number | 18 |
| DOIs | |
| State | Published - Sep 21 2004 |
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Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films. / Olayo-Valles, Roberto; Lund, M. S.; Leighton, C.; Hillmyer, Marc A.
In: Journal of Materials Chemistry, Vol. 14, No. 18, 21.09.2004, p. 2729-2731.Research output: Contribution to journal › Article
}
TY - JOUR
T1 - Large area nanolithographic templates by selective etching of chemically stained block copolymer thin films
AU - Olayo-Valles, Roberto
AU - Lund, M. S.
AU - Leighton, C.
AU - Hillmyer, Marc A.
PY - 2004/9/21
Y1 - 2004/9/21
N2 - Magnetic nanodot arrays were prepared from thin film templates of cylinder-forming polystyrene-polylactide diblock copolymers by first annealing the films to obtain PLA cylinders oriented perpendicular to the surface, then selectively staining the PS matrix with RuO4 vapors, followed by etching the cylinders by O2-reactive ion etching. Metal was then deposited by molecular beam deposition and finally the polymer mask was lifted off.
AB - Magnetic nanodot arrays were prepared from thin film templates of cylinder-forming polystyrene-polylactide diblock copolymers by first annealing the films to obtain PLA cylinders oriented perpendicular to the surface, then selectively staining the PS matrix with RuO4 vapors, followed by etching the cylinders by O2-reactive ion etching. Metal was then deposited by molecular beam deposition and finally the polymer mask was lifted off.
UR - http://www.scopus.com/inward/record.url?scp=4944236339&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=4944236339&partnerID=8YFLogxK
U2 - 10.1039/b408639b
DO - 10.1039/b408639b
M3 - Article
AN - SCOPUS:4944236339
VL - 14
SP - 2729
EP - 2731
JO - Journal of Materials Chemistry
JF - Journal of Materials Chemistry
SN - 0959-9428
IS - 18
ER -