Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography

Reika Katsumata; Helen Wong; Sunshine X. Zhou; Matthew C. Carlson; Christopher J. Ellison; Maruthi Nagavalli Yogeesh; Wei Li; Alvin L. Lee; Deji Akinwande; Stephen M. Sirard; Tao Huang; Richard D. Piner; Richard D. Piner; Zilong Wu; Wei Li; Deji Akinwande; Christopher J. Ellison; Michael J. Maher

doi:10.1016/j.polymer.2016.12.034

Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography

Reika Katsumata, Helen Wong, Sunshine X. Zhou, Matthew C. Carlson, Christopher J. Ellison, Maruthi Nagavalli Yogeesh, Wei Li, Alvin L. Lee, Deji Akinwande, Stephen M. Sirard, Tao Huang, Richard D. Piner, Richard D. Piner, Zilong Wu, Wei Li, Deji Akinwande, Christopher J. Ellison, Michael J. Maher

Chemical Engineering and Materials Science

Research output: Contribution to journal › Article › peer-review

4 Scopus citations

Abstract

Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often include a low-throughput electron beam lithography step that cannot be easily scaled to large areas. In this study, we developed a GNR fabrication method using block copolymer (BCP) lithography that takes advantage of the wetting transparency of graphene. One major advantage of this method is that the self-assembled domains of the polystyrene-block-poly(methyl methacrylate) BCP are oriented perpendicularly directly on top of the graphene where they can later serve as an etch mask. Large area (cm² scale, 3 μm × 3 μm defect-free area) 13–51 nm wide GNR arrays were successfully fabricated using this scalable protocol. This wetting transparency-assisted GNR fabrication method could be useful for high-throughput production of various plasmonic devices, including biosensors, and photodetectors.

Original language	English (US)
Pages (from-to)	131-138
Number of pages	8
Journal	Polymer
Volume	110
DOIs	https://doi.org/10.1016/j.polymer.2016.12.034
State	Published - Feb 10 2017

Bibliographical note

Funding Information:
This work was supported in part by an NSF CAREER (1150034) award (D.A.), and the NSF-NASCENT Engineering Research Center (Cooperative Agreement No. EEC-1160494). C.J.E. thanks the Welch Foundation (grant # F-1709), DuPont Young Professor Award, 3 M Nontenured Faculty Award for partial financial support. The authors would like to thank Jo Wozniak for designing Fig. 1 and the table of contents graphic. We would also like to thank Prof. Seth R. Bank, Kyle McNicholas, Andrew Briggs, Xiaohan Wang and Chae Bin Kim for helpful discussions. We also appreciate Prof. Ananth Dodabalapur, Dr. Dustin Janes, and Barrett Worley for their input in the early stages of this project. R.K. appreciates the Takenaka Scholarship and Graduate Dean's Prestigious Fellowship Supplement for financial support.

Keywords

Block copolymer
Graphene
Nanoribbon

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Katsumata, R., Wong, H., Zhou, S. X., Carlson, M. C., Ellison, C. J., Yogeesh, M. N., Li, W., Lee, A. L., Akinwande, D., Sirard, S. M., Huang, T., Piner, R. D., Piner, R. D., Wu, Z., Li, W., Akinwande, D., Ellison, C. J., & Maher, M. J. (2017). Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography. Polymer, 110, 131-138. https://doi.org/10.1016/j.polymer.2016.12.034

Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography. / Katsumata, Reika; Wong, Helen; Zhou, Sunshine X.; Carlson, Matthew C.; Ellison, Christopher J.; Yogeesh, Maruthi Nagavalli; Li, Wei; Lee, Alvin L.; Akinwande, Deji; Sirard, Stephen M.; Huang, Tao; Piner, Richard D.; Piner, Richard D.; Wu, Zilong; Li, Wei; Akinwande, Deji; Ellison, Christopher J.; Maher, Michael J.

In: Polymer, Vol. 110, 10.02.2017, p. 131-138.

Research output: Contribution to journal › Article › peer-review

Katsumata, R, Wong, H, Zhou, SX, Carlson, MC, Ellison, CJ, Yogeesh, MN, Li, W, Lee, AL, Akinwande, D, Sirard, SM, Huang, T, Piner, RD, Piner, RD, Wu, Z, Li, W, Akinwande, D, Ellison, CJ & Maher, MJ 2017, 'Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography', Polymer, vol. 110, pp. 131-138. https://doi.org/10.1016/j.polymer.2016.12.034

Katsumata, Reika ; Wong, Helen ; Zhou, Sunshine X. ; Carlson, Matthew C. ; Ellison, Christopher J. ; Yogeesh, Maruthi Nagavalli ; Li, Wei ; Lee, Alvin L. ; Akinwande, Deji ; Sirard, Stephen M. ; Huang, Tao ; Piner, Richard D. ; Piner, Richard D. ; Wu, Zilong ; Li, Wei ; Akinwande, Deji ; Ellison, Christopher J. ; Maher, Michael J. / Large area fabrication of graphene nanoribbons by wetting transparency-assisted block copolymer lithography. In: Polymer. 2017 ; Vol. 110. pp. 131-138.

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abstract = "Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often include a low-throughput electron beam lithography step that cannot be easily scaled to large areas. In this study, we developed a GNR fabrication method using block copolymer (BCP) lithography that takes advantage of the wetting transparency of graphene. One major advantage of this method is that the self-assembled domains of the polystyrene-block-poly(methyl methacrylate) BCP are oriented perpendicularly directly on top of the graphene where they can later serve as an etch mask. Large area (cm2 scale, 3 μm × 3 μm defect-free area) 13–51 nm wide GNR arrays were successfully fabricated using this scalable protocol. This wetting transparency-assisted GNR fabrication method could be useful for high-throughput production of various plasmonic devices, including biosensors, and photodetectors.",

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note = "Funding Information: This work was supported in part by an NSF CAREER (1150034) award (D.A.), and the NSF-NASCENT Engineering Research Center (Cooperative Agreement No. EEC-1160494). C.J.E. thanks the Welch Foundation (grant # F-1709), DuPont Young Professor Award, 3 M Nontenured Faculty Award for partial financial support. The authors would like to thank Jo Wozniak for designing Fig. 1 and the table of contents graphic. We would also like to thank Prof. Seth R. Bank, Kyle McNicholas, Andrew Briggs, Xiaohan Wang and Chae Bin Kim for helpful discussions. We also appreciate Prof. Ananth Dodabalapur, Dr. Dustin Janes, and Barrett Worley for their input in the early stages of this project. R.K. appreciates the Takenaka Scholarship and Graduate Dean's Prestigious Fellowship Supplement for financial support.",

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AU - Ellison, Christopher J.

AU - Yogeesh, Maruthi Nagavalli

AU - Li, Wei

AU - Lee, Alvin L.

AU - Akinwande, Deji

AU - Sirard, Stephen M.

AU - Huang, Tao

AU - Piner, Richard D.

AU - Wu, Zilong

AU - Li, Wei

AU - Akinwande, Deji

AU - Ellison, Christopher J.

AU - Maher, Michael J.

N1 - Funding Information: This work was supported in part by an NSF CAREER (1150034) award (D.A.), and the NSF-NASCENT Engineering Research Center (Cooperative Agreement No. EEC-1160494). C.J.E. thanks the Welch Foundation (grant # F-1709), DuPont Young Professor Award, 3 M Nontenured Faculty Award for partial financial support. The authors would like to thank Jo Wozniak for designing Fig. 1 and the table of contents graphic. We would also like to thank Prof. Seth R. Bank, Kyle McNicholas, Andrew Briggs, Xiaohan Wang and Chae Bin Kim for helpful discussions. We also appreciate Prof. Ananth Dodabalapur, Dr. Dustin Janes, and Barrett Worley for their input in the early stages of this project. R.K. appreciates the Takenaka Scholarship and Graduate Dean's Prestigious Fellowship Supplement for financial support.

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N2 - Patterning graphene into nanoribbons (graphene nanoribbons, GNR) allows for tunability in the emerging fields of plasmonic devices in the mid-infrared and terahertz regime. However, the fabrication processes of GNR arrays for plasmonic devices often include a low-throughput electron beam lithography step that cannot be easily scaled to large areas. In this study, we developed a GNR fabrication method using block copolymer (BCP) lithography that takes advantage of the wetting transparency of graphene. One major advantage of this method is that the self-assembled domains of the polystyrene-block-poly(methyl methacrylate) BCP are oriented perpendicularly directly on top of the graphene where they can later serve as an etch mask. Large area (cm2 scale, 3 μm × 3 μm defect-free area) 13–51 nm wide GNR arrays were successfully fabricated using this scalable protocol. This wetting transparency-assisted GNR fabrication method could be useful for high-throughput production of various plasmonic devices, including biosensors, and photodetectors.

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