Ion-Assisted Plasma Etch Modeling of L1₀ Phase FePt Magnetic Media Fabrication with Embedded Mask Patterning Method

Keyphrases

• Ar Plasma 50%
• Carbonyl Products 50%
• Computational Program 50%
• Cost-effective Solution 50%
• Defect Pattern 50%
• Etching Model 100%
• Etching Rate 100%
• FePt 50%
• Flux Distribution 50%
• Grain Boundary Distribution 50%
• Grain Size 50%
• Hard Mask 50%
• Heat-assisted Magnetic Recording 50%
• High Aspect Ratio 100%
• High Aspect Ratio Features 50%
• Induced Defects 50%
• Ion Flux 50%
• Ion-assisted 100%
• L10 Phase 100%
• L10-FePt 50%
• Level-set 50%
• Magnetic Grain 50%
• Magnetic Medium 100%
• Magnetic Properties 100%
• Manufacturability 50%
• Methanol 50%
• Micromagnetic Simulation 50%
• Nanometer-sized 50%
• Pattern Defect 50%
• Pattern-based Approach 100%
• Plasma Etching 100%
• Plasma Etching Process 100%
• Property Change 50%
• Rate of Increase 50%
• Rate-based Model 50%
• Simulation Study 50%
• Synergy Model 50%
• Thermally Stable 50%
• Ultra-high Density 50%
• Ultrasmall 50%

Engineering

• Ar Plasma 33%
• Defects 66%
• Effective Solution 33%
• Etch Rate 66%
• Etching Process 33%
• Grain Boundary 33%
• High Aspect Ratio 100%
• Induced Defect 33%
• Level Set 33%
• Magnetic Recording 33%
• Manufacturability 33%
• Micromagnetics 33%
• Nanometre 33%
• Patterning Method 100%
• Rate Increase 33%
• Rate Model 33%
• Redeposition 100%

Material Science

• Density 50%
• Grain Boundary 50%
• Grain Size 50%
• Magnetic Memory 100%
• Magnetic Property 100%
• Plasma Etching 50%