Investigation of RF-sputtered Fe-Ta-N thin films

Keyphrases

• TiAlN 100%
• Nitrogen Partial Pressure 100%
• Structure-property Relationships 50%
• Magnetic Properties 50%
• Low Nitrogen 50%
• Soft Magnetic Alloy 50%
• Effective Method 50%
• Annealing 50%
• Annealing Temperature 50%
• Gas Mixture 50%
• Deposited Film 50%
• Alloy Thin Films 50%
• Ta Content 50%
• Controlled Crystallization 50%
• RF Reactive Sputtering 50%
• Soft Magnetism 50%
• Amorphous Crystallization 50%

Material Science

• Nanocrystallites 100%
• Thin Films 100%
• Film 66%
• Magnetism 33%
• Magnetic Alloys 33%
• Magnetic Property 33%
• X-Ray Diffraction 33%
• Gas Mixture 33%