Keyphrases
Optical Properties
100%
Structural Properties
100%
Annealing
100%
ZnO Thin Films
100%
Oxygen Partial Pressure
100%
Oxygen Influence
100%
Annealing Temperature
66%
Oxygen Flow
66%
Full Width at Half Maximum
66%
Oxygen Atmosphere
66%
Post-growth Annealing
66%
Low Temperature
33%
Flow Temperature
33%
Thin Film Properties
33%
Low Energy
33%
Grain Size
33%
Crystal Orientation
33%
In Films
33%
Vacancy Defects
33%
Morphological Properties
33%
Oxygen Flow Rate
33%
Argon
33%
Si Substrate
33%
Photoluminescence Measurements
33%
Deposited Film
33%
Temperature Conditions
33%
RF Sputtering
33%
High-resolution X-ray Diffraction (HRXRD)
33%
Annealed Films
33%
Crystalline Properties
33%
Film Quality
33%
Highest Peak
33%
Photoluminescence Intensity
33%
Emission Peak
33%
Oxygen Annealing
33%
Interstitial Defects
33%
Oxygen Mixture
33%
Near-band-edge Emission
33%
Engineering
Oxygen Partial Pressure
100%
Annealing Temperature
100%
Peak Intensity
100%
Thin Films
100%
Structural Property
100%
Constant Temperature
50%
Flow Rate
50%
Low-Temperature
50%
Band Edge
50%
Temperature Condition
50%
Si Substrate
50%
Deposited Film
50%
Film Property
50%
Film Quality
50%
Reduce Oxygen
50%
Emission Peak
50%
Flow Velocity
50%
Crystal Orientation
50%
Material Science
Film
100%
ZnO
100%
Structural Property
100%
Thin Films
100%
Annealing
60%
Photoluminescence
40%
Grain Size
20%
X-Ray Diffraction
20%
Vacancy Defect
20%
Crystal Orientation
20%
Thin Film Property
20%
Interstitial Defect
20%
Morphology
20%
Physics
Thin Films
100%
Photoluminescence
100%
Grain Size
50%
Vacancy Defect
50%
Interstitial Defect
50%
X Ray Diffraction
50%
Flow Velocity
50%