Influence of in-situ annealing ambient on p-type conduction in dual ion beam sputtered Sb-doped ZnO thin films

Sushil Kumar Pandey, Saurabh Kumar Pandey, Vishnu Awasthi, M. Gupta, U. P. Deshpande, Shaibal Mukherjee

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Abstract

Sb-doped ZnO (SZO) films were deposited on c-plane sapphire substrates by dual ion beam sputtering deposition system and subsequently annealed in-situ in vacuum and in various proportions of O2/(O2 + N 2)% from 0% (N2) to 100% (O2). Hall measurements established all SZO films were p-type, as was also confirmed by typical diode-like rectifying current-voltage characteristics from p-ZnO/n-ZnO homojunction. SZO films annealed in O2 ambient exhibited higher hole concentration as compared with films annealed in vacuum or N2 ambient. X-ray photoelectron spectroscopic analysis confirmed that Sb 5+ states were more preferable in comparison to Sb3+ states for acceptor-like SbZn-2VZn complex formation in SZO films.

Original languageEnglish (US)
Article number072109
JournalApplied Physics Letters
Volume103
Issue number7
DOIs
StatePublished - Aug 12 2013

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    Pandey, S. K., Kumar Pandey, S., Awasthi, V., Gupta, M., Deshpande, U. P., & Mukherjee, S. (2013). Influence of in-situ annealing ambient on p-type conduction in dual ion beam sputtered Sb-doped ZnO thin films. Applied Physics Letters, 103(7), [072109]. https://doi.org/10.1063/1.4818819