Influence of deposition conditions on the 1/f noise in hydrogenated amorphous silicon

Keyphrases

• Deposition Conditions 100%
• Hydrogenated Amorphous Silicon 100%
• Deposition Rate 100%
• Angstrom 66%
• Statistical Analysis 33%
• Electronic Properties 33%
• Rate of Increase 33%
• Relaxation Time 33%
• Noise Properties 33%
• A-Si 33%
• Mobility Edge 33%
• Thermal Equilibration 33%
• Thermoelectric 33%
• H2O Content 33%
• Infrared Absorption Spectroscopy 33%
• Dark Conductivity 33%
• Conductivity Activation Energy 33%
• Increased Variability 33%

Engineering

• Hydrogenated Amorphous Silicon 100%
• Deposition Condition 100%
• Deposition Rate 100%
• Equilibration 33%
• Rate Increase 33%
• Dark Conductivity Activation Energy 33%
• Infrared Absorption 33%
• Relaxation Time 33%

Material Science

• Amorphous Silicon 100%
• Electronic Property 50%
• Film 50%
• Activation Energy 50%
• Absorption Spectroscopy 50%