In situ formation of superconducting YBa2Cu3O 7-x thin films using pure ozone vapor oxidation

D. D. Berkley; B. R. Johnson; N. Anand; K. M. Beauchamp; L. E. Conroy; A. M. Goldman; J. Maps; K. Mauersberger; M. L. Mecartney; J. Morton; M. Tuominen; Y. J. Zhang

doi:10.1063/1.100489

In situ formation of superconducting YBa₂Cu₃O _7-x thin films using pure ozone vapor oxidation

D. D. Berkley
, B. R. Johnson
, N. Anand
, K. M. Beauchamp
, L. E. Conroy
, A. M. Goldman
, J. Maps
, K. Mauersberger
, M. L. Mecartney
, J. Morton
, M. Tuominen
, Y. J. Zhang

Research output: Contribution to journal › Article › peer-review

115 Scopus citations

Abstract

Superconducting YBa₂Cu₃O_7- _x thin films have been prepared by coevaporation using an ozone vapor jet as an oxygen source. Films exhibiting zero resistance at 82 K have been fabricated in situ under high vacuum conditions using substrate temperatures of 700°C without a post-evaporation anneal in oxygen. This process has implications for in situ measurements of fully superconducting surfaces using a variety of probes as well as for the fabrication of devices and structures whose properties are dependent on surfaces and interfaces.

Original language	English (US)
Pages (from-to)	1973-1975
Number of pages	3
Journal	Applied Physics Letters
Volume	53
Issue number	20
DOIs	https://doi.org/10.1063/1.100489
State	Published - 1988

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Copyright 2007 Elsevier B.V., All rights reserved.

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10.1063/1.100489

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@article{97d92937644045849f80f20e505b2b2b,

title = "In situ formation of superconducting YBa2Cu3O 7-x thin films using pure ozone vapor oxidation",

abstract = "Superconducting YBa2Cu3O7- x thin films have been prepared by coevaporation using an ozone vapor jet as an oxygen source. Films exhibiting zero resistance at 82 K have been fabricated in situ under high vacuum conditions using substrate temperatures of 700°C without a post-evaporation anneal in oxygen. This process has implications for in situ measurements of fully superconducting surfaces using a variety of probes as well as for the fabrication of devices and structures whose properties are dependent on surfaces and interfaces.",

author = "Berkley, \{D. D.\} and Johnson, \{B. R.\} and N. Anand and Beauchamp, \{K. M.\} and Conroy, \{L. E.\} and Goldman, \{A. M.\} and J. Maps and K. Mauersberger and Mecartney, \{M. L.\} and J. Morton and M. Tuominen and Zhang, \{Y. J.\}",

year = "1988",

doi = "10.1063/1.100489",

language = "English (US)",

volume = "53",

pages = "1973--1975",

journal = "Applied Physics Letters",

issn = "0003-6951",

publisher = "American Institute of Physics",

number = "20",

}

TY - JOUR

T1 - In situ formation of superconducting YBa2Cu3O 7-x thin films using pure ozone vapor oxidation

AU - Berkley, D. D.

AU - Johnson, B. R.

AU - Anand, N.

AU - Beauchamp, K. M.

AU - Conroy, L. E.

AU - Goldman, A. M.

AU - Maps, J.

AU - Mauersberger, K.

AU - Mecartney, M. L.

AU - Morton, J.

AU - Tuominen, M.

AU - Zhang, Y. J.

PY - 1988

Y1 - 1988

N2 - Superconducting YBa2Cu3O7- x thin films have been prepared by coevaporation using an ozone vapor jet as an oxygen source. Films exhibiting zero resistance at 82 K have been fabricated in situ under high vacuum conditions using substrate temperatures of 700°C without a post-evaporation anneal in oxygen. This process has implications for in situ measurements of fully superconducting surfaces using a variety of probes as well as for the fabrication of devices and structures whose properties are dependent on surfaces and interfaces.

AB - Superconducting YBa2Cu3O7- x thin films have been prepared by coevaporation using an ozone vapor jet as an oxygen source. Films exhibiting zero resistance at 82 K have been fabricated in situ under high vacuum conditions using substrate temperatures of 700°C without a post-evaporation anneal in oxygen. This process has implications for in situ measurements of fully superconducting surfaces using a variety of probes as well as for the fabrication of devices and structures whose properties are dependent on surfaces and interfaces.

UR - https://www.scopus.com/pages/publications/0004864065

UR - https://www.scopus.com/pages/publications/0004864065#tab=citedBy

U2 - 10.1063/1.100489

DO - 10.1063/1.100489

M3 - Article

AN - SCOPUS:0004864065

SN - 0003-6951

VL - 53

SP - 1973

EP - 1975

JO - Applied Physics Letters

JF - Applied Physics Letters

IS - 20

ER -