In situ electrochemical monitoring of selective etching in ordered mesoporous block-copolymer templates

Edward J W Crossland, Pedro Cunha, Sabine Ludwigs, Marc A. Hillmyer, Ullrich Steiner

Research output: Contribution to journalArticlepeer-review

9 Scopus citations

Abstract

We present a simple in situ electrochemical probe for the selective etching of the PLA component of thin film poly(4-fluorostyrene)-b-poly(D,L-lactide) (PFS-b-PLA) mesoporous block copolymer templates with a range of highly ordered microphase morphologies. Etching rates between 0.6 and 0.9 nm s -1 were measured in electric-field aligned standing PLA cylinders 12 nm wide and up to 800 nm long. The etching rate within a bicontinuous gyroid network morphology is comparable to that of the hexagonally ordered cylindrical array. A microphase-separated, nonaligned but film-spanning PLA pore structure is found in cylinder forming PFS-b-PLA films immediately after spin coating that could have applications in patterning of functional nanostructured arrays. Cross-film percolation of the PLA phase is confirmed electrochemically, with an etching rate approximately half that of the highly ordered morphologies. The etching rate is independent of template thickness in all three morphologies.

Original languageEnglish (US)
Pages (from-to)1375-1379
Number of pages5
JournalACS Applied Materials and Interfaces
Volume3
Issue number5
DOIs
StatePublished - May 25 2011

Keywords

  • Block copolymers
  • Nanostructured materials
  • Porous materials
  • Self-assembly
  • Thin films

Fingerprint

Dive into the research topics of 'In situ electrochemical monitoring of selective etching in ordered mesoporous block-copolymer templates'. Together they form a unique fingerprint.

Cite this