Abstract
The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 65-76 |
| Number of pages | 12 |
| Journal | Proceedings of SPIE - The International Society for Optical Engineering |
| Volume | 4435 |
| DOIs | |
| State | Published - 2001 |
| Event | Wave Optics and VLSI Photonic Devices for Information Processing - San Diego, CA, United States Duration: Aug 2 2001 → Aug 3 2001 |