The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.
|Original language||English (US)|
|Number of pages||12|
|Journal||Proceedings of SPIE - The International Society for Optical Engineering|
|State||Published - Dec 1 2001|
|Event||Wave Optics and VLSI Photonic Devices for Information Processing - San Diego, CA, United States|
Duration: Aug 2 2001 → Aug 3 2001