Imaging ellipsometry for high-spatial-resolution metrology

Qiwen Zhan; James R. Leger

doi:10.1117/12.451132

Imaging ellipsometry for high-spatial-resolution metrology

Qiwen Zhan, James R. Leger

Electrical and Computer Engineering

Research output: Contribution to journal › Conference article › peer-review

1 Scopus citations

Abstract

The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

Original language	English (US)
Pages (from-to)	65-76
Number of pages	12
Journal	Proceedings of SPIE - The International Society for Optical Engineering
Volume	4435
DOIs	https://doi.org/10.1117/12.451132
State	Published - Dec 1 2001
Event	Wave Optics and VLSI Photonic Devices for Information Processing - San Diego, CA, United States Duration: Aug 2 2001 → Aug 3 2001

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@article{dc2caae1f3e84726908fec6a8feceb2a,

title = "Imaging ellipsometry for high-spatial-resolution metrology",

abstract = "The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.",

author = "Qiwen Zhan and Leger, {James R.}",

year = "2001",

month = dec,

day = "1",

doi = "10.1117/12.451132",

language = "English (US)",

volume = "4435",

pages = "65--76",

journal = "Proceedings of SPIE - The International Society for Optical Engineering",

issn = "0277-786X",

publisher = "SPIE",

note = "Wave Optics and VLSI Photonic Devices for Information Processing ; Conference date: 02-08-2001 Through 03-08-2001",

}

TY - JOUR

T1 - Imaging ellipsometry for high-spatial-resolution metrology

AU - Zhan, Qiwen

AU - Leger, James R.

PY - 2001/12/1

Y1 - 2001/12/1

N2 - The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

AB - The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

UR - http://www.scopus.com/inward/record.url?scp=0035760143&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=0035760143&partnerID=8YFLogxK

U2 - 10.1117/12.451132

DO - 10.1117/12.451132

M3 - Conference article

AN - SCOPUS:0035760143

VL - 4435

SP - 65

EP - 76

JO - Proceedings of SPIE - The International Society for Optical Engineering

JF - Proceedings of SPIE - The International Society for Optical Engineering

SN - 0277-786X

T2 - Wave Optics and VLSI Photonic Devices for Information Processing

Y2 - 2 August 2001 through 3 August 2001

ER -