Imaging ellipsometry for high-spatial-resolution metrology

Qiwen Zhan, James R. Leger

Research output: Contribution to journalConference articlepeer-review

2 Scopus citations


The polarization change that accompanies diffraction from sub-wavelength features is used as a sensitive measure of the feature shape. This sub-wavelength measurement capability is explored by comparing vector-based diffraction models with experimentally obtained data from a novel imaging ellipsometer. This imaging ellipsometer is able to measure samples with high spatial resolution in a parallel fashion by using a high-numerical-aperture lens. Two-dimensional surface maps can be generated without scanning. Our novel metrology tool could provide a solution to the imminent metrology challenges in semiconductor industry.

Original languageEnglish (US)
Pages (from-to)65-76
Number of pages12
JournalProceedings of SPIE - The International Society for Optical Engineering
StatePublished - Dec 1 2001
EventWave Optics and VLSI Photonic Devices for Information Processing - San Diego, CA, United States
Duration: Aug 2 2001Aug 3 2001


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