Hydrogen peroxide production in an atmospheric pressure RF glow discharge: Comparison of models and experiments

C. A. Vasko, D. X. Liu, E. M. Van Veldhuizen, F. Iza, P. J. Bruggeman

Research output: Contribution to journalArticle

39 Scopus citations

Abstract

The production of H 2 O 2 in an atmospheric pressure RF glow discharge in helium-water vapor mixtures has been investigated as a function of plasma dissipated power, water concentration, gas flow (residence time) and power modulation of the plasma. H 2 O 2 concentrations up to 8 ppm in the gas phase and a maximum energy efficiency of 0.12 g/kWh are found. The experimental results are compared with a previously reported global chemical kinetics model and a one dimensional (1D) fluid model to investigate the chemical processes involved in H 2 O 2 production. An analytical balance of the main production and destruction mechanisms of H 2 O 2 is made which is refined by a comparison of the experimental data with a previously published global kinetic model and a 1D fluid model. In addition, the experiments are used to validate and refine the computational models. Accuracies of both model and experiment are discussed.

Original languageEnglish (US)
Pages (from-to)1081-1099
Number of pages19
JournalPlasma Chemistry and Plasma Processing
Volume34
Issue number5
DOIs
StatePublished - Sep 2014

Keywords

  • Atmospheric pressure plasma
  • Chemical kinetics modelling
  • Hydrogen peroxide
  • RF glow discharge
  • Water vapor chemistry

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