Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances

David George; Safaa Hassan; Murthada Adewole; David Lowell; Li Li; Jun Ding; Jingbiao Cui; Hualiang Zhang; Usha Philipose; Yuankun Lin

doi:10.1117/12.2253158

Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances

David George
, Safaa Hassan
, Murthada Adewole
, David Lowell
, Li Li
, Jun Ding
, Jingbiao Cui
, Hualiang Zhang
, Usha Philipose
, Yuankun Lin

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.

Original language	English (US)
Title of host publication	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017
Editors	Winston V. Schoenfeld, Georg von Freymann, Raymond C. Rumpf
Publisher	SPIE
ISBN (Electronic)	9781510606715
DOIs	https://doi.org/10.1117/12.2253158
State	Published - 2017
Externally published	Yes
Event	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017 - San Francisco, United States Duration: Jan 29 2017 → Feb 1 2017

Publication series

Name	Proceedings of SPIE - The International Society for Optical Engineering
Volume	10115
ISSN (Print)	0277-786X
ISSN (Electronic)	1996-756X

Conference

Conference	Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017
Country/Territory	United States
City	San Francisco
Period	1/29/17 → 2/1/17

Bibliographical note

Publisher Copyright:
© 2017 SPIE.

Keywords

2D Photonic Structures
Holographic Lithography
Surface Plasmon Resonance

Publisher link

10.1117/12.2253158

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George, D., Hassan, S., Adewole, M., Lowell, D., Li, L., Ding, J., Cui, J., Zhang, H., Philipose, U., & Lin, Y. (2017). Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances. In W. V. Schoenfeld, G. von Freymann, & R. C. Rumpf (Eds.), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017 Article 1011518 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10115). SPIE. https://doi.org/10.1117/12.2253158

Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances. / George, David; Hassan, Safaa; Adewole, Murthada et al.
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017. ed. / Winston V. Schoenfeld; Georg von Freymann; Raymond C. Rumpf. SPIE, 2017. 1011518 (Proceedings of SPIE - The International Society for Optical Engineering; Vol. 10115).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

George, D, Hassan, S, Adewole, M, Lowell, D, Li, L, Ding, J, Cui, J, Zhang, H, Philipose, U & Lin, Y 2017, Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances. in WV Schoenfeld, G von Freymann & RC Rumpf (eds), Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017., 1011518, Proceedings of SPIE - The International Society for Optical Engineering, vol. 10115, SPIE, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017, San Francisco, United States, 1/29/17. https://doi.org/10.1117/12.2253158

George D, Hassan S, Adewole M, Lowell D, Li L, Ding J et al. Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances. In Schoenfeld WV, von Freymann G, Rumpf RC, editors, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017. SPIE. 2017. 1011518. (Proceedings of SPIE - The International Society for Optical Engineering). doi: 10.1117/12.2253158

George, David ; Hassan, Safaa ; Adewole, Murthada et al. / Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances. Advanced Fabrication Technologies for Micro/Nano Optics and Photonics X 2017. editor / Winston V. Schoenfeld ; Georg von Freymann ; Raymond C. Rumpf. SPIE, 2017. (Proceedings of SPIE - The International Society for Optical Engineering).

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abstract = "Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.",

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author = "David George and Safaa Hassan and Murthada Adewole and David Lowell and Li Li and Jun Ding and Jingbiao Cui and Hualiang Zhang and Usha Philipose and Yuankun Lin",

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AU - George, David

AU - Hassan, Safaa

AU - Adewole, Murthada

AU - Lowell, David

AU - Li, Li

AU - Ding, Jun

AU - Cui, Jingbiao

AU - Zhang, Hualiang

AU - Philipose, Usha

AU - Lin, Yuankun

PY - 2017

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N2 - Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.

AB - Transparent conducting oxides are part of a robust material class that is capable of supporting near-IR surface plasmon resonances (SPRs) which are strongly dependent on size, structure, and doping of the material. This study presents the implementation of holographic lithography to structure large area square lattice cylindrical hole arrays on the transparent conducting oxide thin film, aluminum doped zinc oxide (AZO). For fabricated structures on a glass substrate, SPR are indirectly measured by FTIR transmission and verified with electromagnetic simulations using a finite difference time domain method. Furthermore, it is shown that the SPR excited are standing wave resonances in the (1,1) direction of the lattice array located at the interface of the patterned AZO and glass substrate. This research extends the robust CMOS compatible fabrication techniques of holographic lithography into tunable conductive materials,and contributes to the core technology of future integrated photonics.

KW - 2D Photonic Structures

KW - Holographic Lithography

KW - Surface Plasmon Resonance

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A2 - Schoenfeld, Winston V.

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PB - SPIE

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ER -

Holographic fabrication of hole arrays in AZO for study of surface plasmon resonances

Abstract

Publication series

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Bibliographical note

Keywords

Publisher link

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