Abstract
We report on a novel imaging ellipsometer using a high-numerical-aperture (NA) objective lens capable of measuring a two-dimensional ellipsometric signal with high resolution. Two-dimensional ellipsometric imaging is made possible by spatial filtering at the pupil plane of the objective. A Richards–Wolf vectorial diffraction model and geometrical optics model are developed to simulate the system. The thickness profile of patterned polymethyl methacrylate is measured for calibration purposes. Our instrument has a sensitivity of 5 Å and provides spatial resolution of approximately 0.5 μm with 632.8-nm illumination. Its capability of measuring refractive-index variations with high spatial resolution is also demonstrated.
| Original language | English (US) |
|---|---|
| Pages (from-to) | 4443-4450 |
| Number of pages | 8 |
| Journal | Applied Optics |
| Volume | 41 |
| Issue number | 22 |
| DOIs | |
| State | Published - Aug 1 2002 |
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