High-Resolution, high-aspect-ratio printed and plated metal conductors utilizing roll-to-roll microscale uv imprinting with prototype imprinting stamps

Krystopher S. Jochem; Wieslaw J Suszynski; Daniel Frisbie; Lorraine F Francis

doi:10.1021/acs.iecr.8b03619

High-Resolution, high-aspect-ratio printed and plated metal conductors utilizing roll-to-roll microscale uv imprinting with prototype imprinting stamps

Krystopher S. Jochem, Wieslaw J Suszynski, Daniel Frisbie, Lorraine F Francis

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

Micron-scale, high-aspect-ratio features were imprinted by a roll-to-roll process into a UV-curable polymer and used to create high-current-carrying conductive networks on plastic substrates. A stamp fabrication method was developed to create low-cost, rapidly produced roll-to-roll imprinting stamps, which can mold features from 3 μm to 1 mm wide. Isolated raised features 50 μm high were molded from a 25-μm-thick layer of UV-curable resin by displacing resin into raised features in the stamp. Substrates with imprinted capillary channels were used to form electrical conductors by printing a silver ink into reservoirs connected to the channels and allowing capillary flow to coat the channel. Copper electroless plating then filled the channels. The conductors demonstrate high resolution, high aspect ratio (5:1 height:width), low resistance per length, and easy integration into networks. This roll-to-roll imprinting process provides a foundation for high-throughput manufacturing of high-resolution printed electronics.

Original language	English (US)
Pages (from-to)	16335-16346
Number of pages	12
Journal	Industrial and Engineering Chemistry Research
Volume	57
Issue number	48
DOIs	https://doi.org/10.1021/acs.iecr.8b03619
State	Published - Dec 5 2018

Bibliographical note

Funding Information:
This work was initially supported by the Multi-University Research Initiative program sponsored by the Office of Naval Research (Award N00014-11-1-0690) and then by the National Science Foundation (NSF; Award CMMI-1634263). K.S.J. gratefully acknowledges support from the NSF Graduate Research Fellowship Program under Grant 00039202. Any opinions, findings, and conclusions or recommendations expressed in this material are those of the authors and do not necessarily reflect the views of the National Science Foundation. The authors thank F. Zare Bidoky, Dr. D. Song, and Dr. W. J. Hyun for valuable discussion. The authors thank S. B. Walker and J. L. Lewis for the silver ink used in this research. Parts of this work were carried out in the Characterization Facility, University of Minnesota, which receives partial support from the NSF through the MRSEC program. Portions of this work were conducted in the Minnesota Nano Center, which is supported by the NSF through the National Nano Coordinated Infrastructure Network under Award ECCS-1542202.

Publisher Copyright:
© 2018 American Chemical Society.

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High-Resolution, high-aspect-ratio printed and plated metal conductors utilizing roll-to-roll microscale uv imprinting with prototype imprinting stamps. / Jochem, Krystopher S.; Suszynski, Wieslaw J; Frisbie, Daniel et al.
In: Industrial and Engineering Chemistry Research, Vol. 57, No. 48, 05.12.2018, p. 16335-16346.

Research output: Contribution to journal › Article › peer-review

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High-Resolution, high-aspect-ratio printed and plated metal conductors utilizing roll-to-roll microscale uv imprinting with prototype imprinting stamps

Abstract

Bibliographical note

MRSEC Support

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MRSEC IRG-1: Electrostatic Control of Materials

University of Minnesota MRSEC (DMR-1420013)

MRSEC IRG-2: Sustainable Nanocrystal Materials

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High-Resolution, high-aspect-ratio printed and plated metal conductors utilizing roll-to-roll microscale uv imprinting with prototype imprinting stamps

Abstract

Bibliographical note

MRSEC Support

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Projects

MRSEC IRG-1: Electrostatic Control of Materials

University of Minnesota MRSEC (DMR-1420013)

MRSEC IRG-2: Sustainable Nanocrystal Materials

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