Growth of crystalline ZnO thin films on silicon (100) and sapphire (0001) by pulsed laser deposition

Keyphrases

• Sapphire 100%
• Atomic Force Microscopy 100%
• Crystalline ZnO 100%
• Pulsed Laser Deposition 100%
• ZnO Thin Films 100%
• Diffraction 50%
• Substrate Temperature 50%
• Processing Parameters 50%
• Raman Spectra 50%
• Raman Spectroscopy 50%
• Si Substrate 50%
• Deposition Temperature 50%
• Surface Morphology 50%
• Silicon Substrate 50%
• Sapphire Substrate 50%
• Full Width at Half Maximum 50%
• Average Roughness 50%
• Zinc Oxide Thin Films 50%
• Laser Fluence 50%
• Diffraction Lines 50%

Material Science

• Silicon 100%
• ZnO 100%
• Sapphire 100%
• Pulsed Laser Deposition 100%
• Thin Films 100%
• Atomic Force Microscopy 40%
• Zinc Oxide 20%
• Film 20%
• Raman Spectroscopy 20%
• Surface Morphology 20%

Engineering

• Thin Films 100%
• Pulsed Laser 100%
• Atomic Force Microscopy 40%
• Ray Diffraction 40%
• Sapphire Substrate 20%
• Si Substrate 20%
• Silicon Substrate 20%
• Deposited Film 20%
• Substrate Temperature 20%
• Deposition Temperature 20%
• Laser Fluence 20%
• Processing Parameter 20%
• Surface Morphology 20%
• Raman Spectra 20%
• Full width at half maximum 20%